{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"在掺杂不同浓度的六偏磷酸盐溶液中，利用“点籽晶”快速生长法生长了 KDP 晶体，生长速度约20 mm/d.研究了六偏磷酸盐对快速生长的 KDP 晶体的生长及光学性能的影响，并与传统慢速生长的晶体进行了对比.实验表明，溶液中掺杂少量六偏磷酸盐就会显著降低生长溶液的稳定性，抑制晶体的生长，生长的晶体容易出现包藏、添晶、粉碎性裂纹等缺陷；生长的晶体光学质量也明显下降，例如晶体内部的光散射加重，激光损伤阈值降低；相比传统生长法生长的晶体，同等浓度的六偏磷酸盐对“点籽晶”快速生长法生长的晶体影响更为严重.结合 KDP 的晶体结构和六偏磷酸盐的分子特点，对其影响机理进行了讨论.","authors":[{"authorName":"朱胜军","id":"3048e305-3af4-48b3-a262-2a5433088c46","originalAuthorName":"朱胜军"},{"authorName":"王圣来","id":"2aa637c0-76c9-400e-ac87-24e0c80b1fd3","originalAuthorName":"王圣来"},{"authorName":"丁建旭","id":"db0fc2bb-f92a-421b-8d61-d2b3c1227c3f","originalAuthorName":"丁建旭"},{"authorName":"刘光霞","id":"d4616c62-ef67-4ac3-8ffb-7fa3f3031919","originalAuthorName":"刘光霞"},{"authorName":"刘文洁","id":"14ec218a-7afd-44a3-81cf-6b9fa8c49c11","originalAuthorName":"刘文洁"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"a140bf4b-1747-46a3-8f67-f05ef22aae9a","originalAuthorName":"刘琳"},{"authorName":"顾庆天","id":"f458a48d-29e4-461c-8fdb-c5896b3a6a66","originalAuthorName":"顾庆天"},{"authorName":"许心光","id":"6f7217ca-17ae-4469-9bcf-a342f583d557","originalAuthorName":"许心光"}],"doi":"10.3969/j.issn.1001-9731.2014.01.015","fpage":"1067","id":"0e1c0f69-af29-45ad-8e1e-c9b4c6a092f2","issue":"1","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"2dad613a-075d-4658-9fa7-baecb09a13c6","keyword":"KDP晶体","originalKeyword":"KDP晶体"},{"id":"cff924c9-bde6-41cf-8487-d158ea7af32f","keyword":"六偏磷酸盐","originalKeyword":"六偏磷酸盐"},{"id":"b7122c51-b94d-4552-b641-64e91cd7beb3","keyword":"快速生长","originalKeyword":"快速生长"},{"id":"68bf3657-8863-4bda-80da-ff5af8ef517e","keyword":"晶体缺陷","originalKeyword":"晶体缺陷"},{"id":"11d94e81-d4d7-4902-831f-6a9401b2df52","keyword":"光学性能","originalKeyword":"光学性能"}],"language":"zh","publisherId":"gncl201401015","title":"六偏磷酸盐对 KDP 晶体快速生长及光学性能的影响研究","volume":"","year":"2014"},{"abstractinfo":"在不同转速下用传统法生长了KDP晶体,并根据生长槽的实际情况,建立了三维数学模型.利用有限容积法,对晶体生长槽内的速度场和温度场进行了数值模拟,分析了不同晶体转速和晶体生长对速度场和温度场的影响规律.结果表明,随着晶体转速的增大,溶液流速越来越大,晶体生长更快,杂晶减少；较高转速(55 r/min和77r/min)较于较低转速(9.0～40 r/min)更有利于晶体生长.","authors":[{"authorName":"刘光霞","id":"d20af692-ce9e-47f0-88c3-8752d1906feb","originalAuthorName":"刘光霞"},{"authorName":"王圣来","id":"379e207a-ab86-45a4-a528-bb627d3fc73a","originalAuthorName":"王圣来"},{"authorName":"顾庆天","id":"8584650b-40ba-49b8-9cbf-7806350ebfd1","originalAuthorName":"顾庆天"},{"authorName":"丁建旭","id":"686f5dc0-89da-4f9f-b64d-8f9856cc2238","originalAuthorName":"丁建旭"},{"authorName":"孙云","id":"e3a6c216-cb01-4add-832d-9b33d10609e3","originalAuthorName":"孙云"},{"authorName":"刘文洁","id":"128d6282-404e-446e-b198-d340b318a430","originalAuthorName":"刘文洁"},{"authorName":"朱胜军","id":"c3b62d45-6de6-4a40-9024-43dd44d9ea28","originalAuthorName":"朱胜军"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"6dd65d9f-2baa-4dac-832d-bce32bba358a","originalAuthorName":"刘琳"}],"doi":"","fpage":"1261","id":"109ec6be-aad7-4b85-9dd3-7e9ed6ac6662","issue":"7","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"740ffa37-54fc-4122-8d58-2d84a5851a40","keyword":"KDP晶体","originalKeyword":"KDP晶体"},{"id":"3f26329f-927d-41b1-8e94-a16926ef4492","keyword":"数值模拟","originalKeyword":"数值模拟"},{"id":"add358a9-7115-4044-a586-edb8b3d8c901","keyword":"速度场","originalKeyword":"速度场"},{"id":"7dab8976-8c40-48d7-805d-56f63de028c6","keyword":"温度场","originalKeyword":"温度场"}],"language":"zh","publisherId":"rgjtxb98201307004","title":"传统法KH2PO4(KDP)晶体生长温场和速度场的数值模拟研究","volume":"42","year":"2013"},{"abstractinfo":"采用传统降温法生长了一系列的 K (H1-xDx)2PO4晶体。粉末X射线衍射(XRD)证明氘化后晶体的对称性并没有发生改变,晶胞参数a 随氘含量的增加而增大,参数c 则小幅度增大。对晶体的高分辨 X 射线衍射研究,结果表明 KDP-DKDP 混晶中,D取代部分的 H 原子对晶体的结晶完整性影响较小。","authors":[{"authorName":"刘文洁","id":"25e18e84-87bf-4f94-b858-993f7d3851fe","originalAuthorName":"刘文洁"},{"authorName":"丁建旭","id":"b3945cd0-4ad1-4fa5-b8e8-98d9e2ecece7","originalAuthorName":"丁建旭"},{"authorName":"牟晓明","id":"c54f9043-c33b-4d32-881d-c430a181c55b","originalAuthorName":"牟晓明"},{"authorName":"刘光霞","id":"c34ed9c3-af55-4d6c-971b-df9a9ed27e0d","originalAuthorName":"刘光霞"},{"authorName":"孙云","id":"abd5e311-f842-4258-ab9e-29de24826bfd","originalAuthorName":"孙云"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"400d9b29-4415-4785-bb13-500986b7adf4","originalAuthorName":"刘琳"},{"authorName":"王圣来","id":"96b8ba89-5151-450a-b180-f9c542e6a3f2","originalAuthorName":"王圣来"},{"authorName":"顾庆天","id":"cf58c7cb-6d27-47a4-a1a8-189b0a038219","originalAuthorName":"顾庆天"}],"doi":"10.3969/j.issn.1001-9731.2013.21.015","fpage":"3122","id":"65ea0892-9d27-4afd-8c31-a252351f1061","issue":"21","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"7efdaae8-eb88-4976-a897-2dd9ce5aeeea","keyword":"K(H1-xDx)2PO4 晶体","originalKeyword":"K(H1-xDx)2PO4 晶体"},{"id":"3e83586f-b2d8-4197-aa63-cdeb19cbf7aa","keyword":"粉末","originalKeyword":"粉末"},{"id":"0e01faca-d058-419d-8132-0f7c2e6765af","keyword":"X射线衍射","originalKeyword":"X射线衍射"},{"id":"6027bb1f-7151-4c47-b102-c6f187ca6d73","keyword":"晶胞参数","originalKeyword":"晶胞参数"},{"id":"75251f87-ee02-4ac5-b075-b04bfc8e1bbd","keyword":"高分辨X射线衍射","originalKeyword":"高分辨X射线衍射"},{"id":"f9d513f8-f8f4-427a-b622-b44d9c9ae1ea","keyword":"结晶完整性","originalKeyword":"结晶完整性"}],"language":"zh","publisherId":"gncl201321015","title":"氘含量对K（H1-xDx）2PO4晶体结构及完整性的影响","volume":"","year":"2013"},{"abstractinfo":"在不同过饱和度的溶液中生长了KDP晶体,对生长晶体的透过率,光散射和激光损伤阈值进行了表征.研究了不同过饱和度对KDP晶体生长及光学性能的影响.实验表明:KDP晶体可以在高过饱和度(σ＞3％)溶液中实现快速生长,生长速度可大于10 mm/d;但随着溶液过饱和度的增加,KDP晶体生长溶液的稳定性降低,晶体容易出现包藏、开裂和添晶等缺陷,晶体的光学性能也随之降低.","authors":[{"authorName":"朱胜军","id":"9758fc4c-054a-4e6a-9abd-22e9e4602461","originalAuthorName":"朱胜军"},{"authorName":"王圣来","id":"1cb195ca-427d-4b2b-80df-c31e891e9b5d","originalAuthorName":"王圣来"},{"authorName":"丁建旭","id":"62531b29-cc25-4343-b642-5541efb301f7","originalAuthorName":"丁建旭"},{"authorName":"刘光霞","id":"9749b167-0bf7-477b-aac4-886bd990c42f","originalAuthorName":"刘光霞"},{"authorName":"王端良","id":"58e298e0-a972-4d07-b356-5d0b36d05a0c","originalAuthorName":"王端良"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"ad09f6c2-cb39-4404-894f-299c1a2eb707","originalAuthorName":"刘琳"},{"authorName":"顾庆天","id":"b50c5918-0474-45bf-b5b9-67817d98fc29","originalAuthorName":"顾庆天"},{"authorName":"许心光","id":"e9c05bc2-d60a-44a5-8120-ba39a841d459","originalAuthorName":"许心光"}],"doi":"","fpage":"1973","id":"6ad85d47-af94-4354-975c-1784949c4b91","issue":"10","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"d998bb5b-3759-4198-bee0-4ed75c5807d1","keyword":"KDP晶体","originalKeyword":"KDP晶体"},{"id":"29b8f657-4dd9-4e6b-a5ab-8833b78215ae","keyword":"过饱和度","originalKeyword":"过饱和度"},{"id":"ea52de64-869e-4388-a526-f39b5a576492","keyword":"稳定性","originalKeyword":"稳定性"},{"id":"0774df85-a400-4e32-835f-9493005599b6","keyword":"透过率","originalKeyword":"透过率"},{"id":"67ee3266-1c8e-48e3-beb0-db7ced924f9c","keyword":"缺陷","originalKeyword":"缺陷"}],"language":"zh","publisherId":"rgjtxb98201310001","title":"过饱和度对KDP晶体生长与光学性能的影响研究","volume":"42","year":"2013"},{"abstractinfo":"在添加不同浓度(0~5×10-3)EDTA 的KDP饱和溶液中,采用“点籽晶”快速生长技术生长了KDP晶体,生长速度约20 mm/d.研究了不同浓度的EDTA对KDP晶体快速生长的影响.实验发现,随着溶液中EDTA添加量的增加,KDP 晶体(100)面的生长速度是先增加经过一个最大值然后减小；晶体宏观外形高宽比则是先减小经过一个最小值然后增加.在溶液中添加适量浓度的EDTA(5×10-5~5×10-4)可以有效地提高生长溶液的稳定性；而过量的添加 ED-TA(＞1×10-3)反而会破坏溶液的稳定性,当溶液中EDTA浓度增至5×10-3时,溶液甚至发生“雪崩”,晶体出现母液包藏、添晶和粉碎性裂纹等缺陷.结合KDP的晶体结构和EDTA的分子特点,对其影响机理进行了讨论.","authors":[{"authorName":"朱胜军","id":"6d3e3bb1-6e81-444b-8673-d64ba752cf10","originalAuthorName":"朱胜军"},{"authorName":"王圣来","id":"9bbdec75-015c-49ad-964f-bf5044391698","originalAuthorName":"王圣来"},{"authorName":"丁建旭","id":"65f9f138-5c70-4063-beb3-f8d3a07b93ac","originalAuthorName":"丁建旭"},{"authorName":"刘光霞","id":"acb23c71-de2d-4a6f-acbe-275ecabf8aa6","originalAuthorName":"刘光霞"},{"authorName":"王端良","id":"791237eb-f85f-4e18-82fc-738fa252e4f8","originalAuthorName":"王端良"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"1c396dc1-3c36-4030-8ed5-eacf67c023db","originalAuthorName":"刘琳"},{"authorName":"顾庆天","id":"f0a9418a-9c88-4bc6-84da-e6f743ec58fe","originalAuthorName":"顾庆天"},{"authorName":"许心光","id":"7f088785-1bd8-4d10-9473-472460e1902c","originalAuthorName":"许心光"}],"doi":"10.3969/j.issn.1001-9731.2014.05.017","fpage":"5074","id":"d41392d5-425d-441d-bf72-923056226f47","issue":"5","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"ac714732-014c-4199-838e-d1d88321b257","keyword":"KDP晶体","originalKeyword":"KDP晶体"},{"id":"d3df8dd4-0893-4426-9c11-665f1092ab72","keyword":"添加剂","originalKeyword":"添加剂"},{"id":"68f95567-df20-471e-9f5b-37c302b1cd3e","keyword":"快速生长","originalKeyword":"快速生长"},{"id":"7931af50-4d2a-4c9f-b273-fd7f5cd70885","keyword":"溶液稳定性","originalKeyword":"溶液稳定性"}],"language":"zh","publisherId":"gncl201405017","title":"添加剂EDTA对KDP晶体快速生长的影响研究","volume":"","year":"2014"},{"abstractinfo":"对QBe1.9铜合金进行双辉等离子渗Ti及后续离子氮化复合处理，在其表面制备TiN(Ti2N)/Ti合金层以改善其摩擦磨损性能。采用扫描电镜、能谱、辉光放电光谱仪、X射线衍射仪等手段观察分析Ti-N复合渗合金层的组织、成分及相结构，对合金层硬度及导电性进行了分析，并利用往复球盘摩擦磨损试验机研究QBe1.9基材及其Ti-N复合渗后的摩擦磨损性能。结果表明：经过Ti-N复合处理后，在QBe1.9铜合金表面形成厚度为27μm的复合渗层，该渗层包括表面富TiN(Ti2N)合金层和Ti-Be-Cu扩散过渡层；QBe1.9铜合金经Ti-N复合渗后，表面硬度达964 HV，比基材的硬度明显提高；摩擦因数和比磨损率分别仅为未处理基材的30%和1.38%，达到减摩耐磨效果。表面高硬氮化物的形成是Ti-N复合渗改善QBe1.9铜合金表面性能的主要原因。","authors":[{"authorName":"<span style=\"color:red\">刘琳</span>","id":"fb4b016a-e28c-4758-a7fa-85ca4138b763","originalAuthorName":"刘琳"},{"authorName":"申航航","id":"7a0cdddb-cf9e-49b2-bee3-e69856a43b1b","originalAuthorName":"申航航"},{"authorName":"刘小镇","id":"05d7f8be-9e24-4265-879d-b88002b65d05","originalAuthorName":"刘小镇"},{"authorName":"郭麒","id":"ed9dc625-75d3-42e2-9d96-9a5104fc1302","originalAuthorName":"郭麒"},{"authorName":"孟天旭","id":"3085b885-3a73-4be1-9f4b-e907bc99f60f","originalAuthorName":"孟天旭"},{"authorName":"王振霞","id":"3d0129f7-f55d-4581-a676-a65962a3f2f8","originalAuthorName":"王振霞"},{"authorName":"刘小萍","id":"5c8dedb7-7321-492e-beaf-3f86f12cb9db","originalAuthorName":"刘小萍"}],"doi":"","fpage":"2605","id":"9c5e5d0f-8e35-40cb-97e2-a7197091d4a0","issue":"12","journal":{"abbrevTitle":"ZGYSJSXB","coverImgSrc":"journal/img/cover/ZGYSJSXB.jpg","id":"88","issnPpub":"1004-0609","publisherId":"ZGYSJSXB","title":"中国有色金属学报"},"keywords":[{"id":"0db65804-f3e9-42d9-8acd-d09621a83a38","keyword":"QBe1.9铜合金","originalKeyword":"QBe1.9铜合金"},{"id":"ae7cef58-325f-4df4-982e-0fcadc6a45ed","keyword":"等离子渗Ti","originalKeyword":"等离子渗Ti"},{"id":"91490ff4-f850-492f-98c1-ed4cb642f54c","keyword":"离子氮化","originalKeyword":"离子氮化"},{"id":"87bdf95b-60b3-40fe-9fae-b3e8772dc0df","keyword":"导电性","originalKeyword":"导电性"},{"id":"450c9845-4499-4605-a1be-64ef05eef74e","keyword":"摩擦","originalKeyword":"摩擦"},{"id":"44421ac3-9b43-42c6-aee1-435307bda16d","keyword":"磨损","originalKeyword":"磨损"}],"language":"zh","publisherId":"zgysjsxb201612017","title":"QBe1.9铜合金Ti-N等离子复合渗及其摩擦磨损性能","volume":"26","year":"2016"},{"abstractinfo":"以矿渣、粉煤灰为原料,以硅酸钠和氢氧化钠为激发剂,制备了矿渣-粉煤灰基地质聚合物,测试了不同配合比下矿渣-粉煤灰基地质聚合物的7 d、14 d和28d的抗压强度.结果表明:当水胶比为0.3,氢氧化钠和硅酸钠的质量比为0.63,矿渣与粉煤灰的质量比为2,标准养护条件下,矿渣-粉煤灰基地质聚合物的7 d、14 d和28 d龄期的抗压强度分别达到57.0 MPa、69.0 MPa和84.3 MPa.","authors":[{"authorName":"尚建丽","id":"df3ce039-4646-4c02-bd67-e379fe66402c","originalAuthorName":"尚建丽"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"0c95f92e-3d68-4929-9bef-78f0c53dadde","originalAuthorName":"刘琳"}],"doi":"","fpage":"741","id":"03421311-d547-4038-8ca6-519adf60c2f8","issue":"3","journal":{"abbrevTitle":"GSYTB","coverImgSrc":"journal/img/cover/GSYTB.jpg","id":"36","issnPpub":"1001-1625","publisherId":"GSYTB","title":"硅酸盐通报   "},"keywords":[{"id":"40130e7d-669d-46a1-9c42-afdc138ffd35","keyword":"矿渣","originalKeyword":"矿渣"},{"id":"28e3c706-0175-474c-a25c-a8593ac20b22","keyword":"粉煤灰","originalKeyword":"粉煤灰"},{"id":"0f37ec10-5ac2-445a-9f77-e5db1eb40ecb","keyword":"地质聚合物","originalKeyword":"地质聚合物"},{"id":"a8e2f92d-f98c-4c46-8379-0b4c750f08a9","keyword":"抗压强度","originalKeyword":"抗压强度"}],"language":"zh","publisherId":"gsytb201103051","title":"矿渣-粉煤灰地质聚合物制备及力学性能研究","volume":"30","year":"2011"},{"abstractinfo":"对未添加和添加25 μg/g二硫代噻二唑衍生物的喷气燃料油样进行了银片腐蚀实验研究.通过采用失重法和金相显微镜技术,考察不同浓度的二硫代噻二唑衍生物在含有硫化氢油品中对银片的缓蚀效果,结果表明,二硫代噻二唑衍生物的浓度为25 μg/g时,缓蚀效率高达95.09％.通过吸附热力学实验,表明二硫代噻二唑衍生物的吸附符合Langmuir吸附等温方程,且它在银片表面的吸附属于化学吸附.","authors":[{"authorName":"<span style=\"color:red\">刘琳</span>","id":"342dd0d5-33e3-420a-b6a4-ac372383401c","originalAuthorName":"刘琳"},{"authorName":"潘晓娜","id":"c080b86c-4e12-411b-9a4a-2afe4e1666e4","originalAuthorName":"潘晓娜"},{"authorName":"刘璐","id":"b7ce5cfd-f201-4269-b0cd-d231ce38c152","originalAuthorName":"刘璐"},{"authorName":"邢锦娟","id":"a7ef1e42-6a1f-47b9-86d6-18ca1f59b147","originalAuthorName":"邢锦娟"}],"doi":"","fpage":"51","id":"05fa04a5-9780-4721-9b6b-e22d72329f2b","issue":"4","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"de682d09-de4b-4e7d-bd37-5d23d9160d76","keyword":"银片腐蚀实验","originalKeyword":"银片腐蚀实验"},{"id":"cd599628-ca4f-4eda-be98-6ad9959bffa7","keyword":"二硫代噻二唑衍生物","originalKeyword":"二硫代噻二唑衍生物"},{"id":"a7b2a10e-19ee-415f-989e-92f32cb02405","keyword":"H2S","originalKeyword":"H2S"},{"id":"2cd1f54e-1b3d-4637-b5ce-40698098c79e","keyword":"缓蚀剂","originalKeyword":"缓蚀剂"},{"id":"514a764c-78c3-441b-8a11-ff887d9accb5","keyword":"吸附等温方程","originalKeyword":"吸附等温方程"}],"language":"zh","publisherId":"cldb201404014","title":"含H2S喷气燃料中噻二唑衍生物对银片缓蚀性能的研究","volume":"28","year":"2014"},{"abstractinfo":"石墨烯以其独特的二维结构和优异的性能成为材料领域的研究热点。它在改善聚合物复合材料的电学性能、热学性能和力学性能等方面具有很大的潜力。综述了近些年石墨烯/聚合物导电复合材料制备与应用领域的研究，并对石墨烯/聚合物导电复合材料的发展前景进行了展望。","authors":[{"authorName":"<span style=\"color:red\">刘琳</span>","id":"7738e9fe-8ea5-4f80-be12-3bfabb3cbdc6","originalAuthorName":"刘琳"},{"authorName":"张东","id":"2807e32f-f6e1-48bf-bc00-15e1c87a1dfd","originalAuthorName":"张东"}],"doi":"10.3969/j.issn.1001-9731.2014.增刊(Ⅰ).002","fpage":"7","id":"0c0e80c7-0e7f-4c6e-8838-655755ad52c7","issue":"z1","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"492fe0a9-abb9-4d72-ab83-c36b49a0c9e1","keyword":"石墨烯","originalKeyword":"石墨烯"},{"id":"88f232b6-2fb8-4758-822d-9e1994657392","keyword":"聚合物","originalKeyword":"聚合物"},{"id":"40917d5a-b403-47a5-8521-1fff38d34b59","keyword":"导电","originalKeyword":"导电"},{"id":"e6e3a139-40be-4a55-afed-7f0421666941","keyword":"复合材料","originalKeyword":"复合材料"}],"language":"zh","publisherId":"gncl2014z1002","title":"石墨烯/聚合物导电复合材料的研究","volume":"","year":"2014"},{"abstractinfo":"采用水热法直接制备了油酸修饰的纳米氧化锌微粒.用XRD、SEM、IR和UV-Vis等检测手段对样品进行表征.结果表明:所制备的样品为纤锌矿结构的氧化锌微粒,平均粒度为44 nm;油酸分子与锌原子以桥连的形式结合;氧化锌微粒有明显的量子尺寸效应.分散性实验表明:样品在非极性的有机溶剂中有良好的分散性.","authors":[{"authorName":"钱建华","id":"c9744a71-ecb1-4b9c-889d-c9644acf04fd","originalAuthorName":"钱建华"},{"authorName":"田静博","id":"a77210bc-6630-4b32-b780-586f25524e8d","originalAuthorName":"田静博"},{"authorName":"秦金兰","id":"c53ff0bf-3551-4024-9b3b-48be50bcbaf8","originalAuthorName":"秦金兰"},{"authorName":"邢锦娟","id":"a303be29-08a9-4b6c-86cb-a00d9554a127","originalAuthorName":"邢锦娟"},{"authorName":"<span style=\"color:red\">刘琳</span>","id":"37c58e5a-0abd-475d-8b60-e780013c4c99","originalAuthorName":"刘琳"}],"doi":"","fpage":"963","id":"0cacf600-261d-4fd6-80f5-7dcdde79f4aa","issue":"5","journal":{"abbrevTitle":"GSYTB","coverImgSrc":"journal/img/cover/GSYTB.jpg","id":"36","issnPpub":"1001-1625","publisherId":"GSYTB","title":"硅酸盐通报   "},"keywords":[{"id":"a40ff7e1-8d09-4ae0-aafa-03c0e7014673","keyword":"氧化锌纳米微粒","originalKeyword":"氧化锌纳米微粒"},{"id":"06dc085d-16d4-4062-9b98-46587efdc659","keyword":"油酸","originalKeyword":"油酸"},{"id":"51719b12-07c3-44d1-8507-5b388625aacb","keyword":"表面修饰","originalKeyword":"表面修饰"},{"id":"c6e53f09-fc4e-4776-8725-7d0a1434103b","keyword":"分散性","originalKeyword":"分散性"}],"language":"zh","publisherId":"gsytb200805016","title":"油酸修饰氧化锌纳米微粒的制备、表征和性能","volume":"27","year":"2008"}],"totalpage":7,"totalrecord":61}