Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating

材料科学技术（英）, 2009, 25(5): 681-686.

^1, , ^2, , ^3, , ^4, , ^5,

1.Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

2.Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116085, China

3.Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

4.Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116085, China

5.Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

基金项目: the National Natural Science Foundation of China under(50801062)

Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating

Yanhui Zhao ^1, , Guoqiang Lin ^2, , Jinquan Xiao ^3, , Chuang Dong ^4, , Lishi Wen ^5,

1.Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

2.Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116085, China

3.Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

4.Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116085, China

5.Institute of Metals Research, Chinese Academy of Sciences, Shenyang 110016, China

Keywords： Arc ion plating

Orthogonal experiments are used to design the pulsed bias related parameters, including bias magnitude, duty cycle and pulse frequency, during arc ion deposition of TiN films on stainless steel substrates in the case of samples placing normal to the plasma flux. The effect of these parameters on the amount and the size distribution of droplet-particles are investigated, and the results have provided sufficient evidence for the physical model, in which particles reduction is due to the case that the particles are negatively charged and repulsed from negative pulse electric field. The effect of sample configuration on amount and size distribution of the particles are analyzed. The results of the amount and size distribution of the particles are compared to those in the case of samples placing parallel to the plasma flux.

参考文献

[1]	J.Fessman;W.Olbrich;G.Kampschulte .[J].Materials Science and Engineering,1991,A140:830.
[2]	W.Olbrich;G.Kampschulte .[J].Surface and Coatings Technology,1993,59:274.
[3]	M.Kumagai;K.Yukimura;E.Kuze;T.Maruyama,M.Kohata,K.Numata,H.Saito and X.X.Ma .[J].Surface and Coatings Technology,2003,169/170:401.
[4]	R.R.Aharonov;M.Chhowalla;S.Dhar;R.P.Fontana .[J].Surface and Coatings Technology,1996,82:334.
[5]	Z.Y.Li;W.B.Zhu;Y.Zhang;G.Y.Li and E.Y.Cao .[J].Surface and Coatings Technology,2000,131:158.
[6]	M.D.Huang;G.Q.Lin;C.Dong;C.Sun and L.S.Wen .[J].ACTA METALLURGICA SINICA,2003,39:510.
[7]	M.D.Huang;G.Q.Lin;Y.H.Zhao;C.Sun,L.S.Wen and C.Dong .[J].Surface and Coatings Technology,2003,176:109.
[8]	Y.H.Zhao;G.Q.Lin;C.Dong;L.S.Wen .[J].Journal of Materials Science and Technology,2005,21:423.
[9]	G.Q.Lin;Y.H.Zhao;H.M.Guo;D.Z.Wang and C.Dong .[J].Journal of Vacuum Science and Technology,2004,A22:1218.
[10]	M. Keidar;R. Aharonov;I. I. Beilis .Influence of a electrical field on the macroparticle size distribution in a vacuum arc[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,1999(5):3067-3073.
[11]	M.Keidar;I.Beilis;R.L.Boxman;S.Goldsmith .[J].Surface and Coatings Technology,1996,86/87:415.
[12]	T.Nitter .[J].Plasma Sources Sci Techno!,1996,5:93.
[13]	A.Edlberg;E.S.Aydil .[J].Journal of Applied Physics,1999,86:479.
[14]	M.Keidar;I.Beilis;R.L.Boxman;S.Goldsmith .[J].IEEE Transactions on Plasma Science,1996,24:226.
[15]	I.I.Aksenov;V.A.Belous;V.G.Padalka;V.M.KhoroshikhSov .[J].Journal of Plasma Physics,1978,4:425.
[16]	A.W.Baouchi;A.J.Perry .[J].Surface and Coatings Technology,1991,49:253.
[17]	H.Wang;J.Zou;Z.Cheng;L.Cheng.[A].,1992:315.
[18]	S.Shalev;R.L.Boxman;S.Goldsmith .[J].Journal of Applied Physics,1995,58:2503.
[19]	M.Keidar .[J].IEEE Transactions on Plasma Science,1995,23:902.
[20]	T.Nitter;T.K.Aslaksen;F.Melands;O.Havnes .[J].IEEE Transactions on Plasma Science,1994,22:159.
[21]	H.M.Guo;G.Q.Lin;M.Y.Sheng;D.Z.Wang and C.Dong .[J].Acta Metallurgica Sinica,2004,40:1064.
[22]	M.D.Huang .[D].大连:大连理工大学,2002.

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材料期刊网

Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating

参考文献