Substrate Temperature Dependent Properties of Cu Doped NiO Films Deposited by DC Reactive Magnetron Sputtering

材料科学技术（英）, 2013, 29(7): 647-651.

^1, , ^2, , ^3,

1.Department of Physics, Sri Venkateswara University, Tirupathi 517502, India

2.Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City, South Korea

3.Department of Physics, Sri Venkateswara University, Tirupathi 517502, India

基金项目: New Delhi (File No.F.40-419/2011(SR)) for providing the financial assistance to carry out the above work The authors would like to express their gratitude to the University Grants Commission

Substrate Temperature Dependent Properties of Cu Doped NiO Films Deposited by DC Reactive Magnetron Sputtering

Yarraguntla Ashok Kumar Reddy ^1, , Akepati Sivasankar Reddy ^2, , Pamanji Sreedhara Reddy ^3,

1.Department of Physics, Sri Venkateswara University, Tirupathi 517502, India

2.Division of Advanced Materials Engineering, Kongju National University, Budaedong, Cheonan City, South Korea

3.Department of Physics, Sri Venkateswara University, Tirupathi 517502, India

Keywords： Sputtering

参考文献

[1]	H. Kumagai;M. Matsumoto;K. Toyoda;M. Obara .Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions[J].Journal of Materials Science Letters,1996(12):1081-1083.
[2]	S Nandy;U N Maiti;C K Ghosh;K K Chattopadhyay .Enhanced p-type conductivity and band gap narrowing in heavily Al doped Ni0 thin films deposited by RF magnetron sputtering[J].Journal of Physics. Condensed Matter,2009(11):115804-7.
[3]	A. Mallikarjuna Reddy;A. Sivasankar Reddy;Kee-Sun Lee .Effect of oxygen partial pressure on the structural, optical and electrical properties of sputtered NiO films[J].CERAMICS INTERNATIONAL,2011(7):2837-2843.

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Substrate Temperature Dependent Properties of Cu Doped NiO Films Deposited by DC Reactive Magnetron Sputtering

参考文献