Fe-Cu thin films of 0.2μm in thickness with different Cu contents were prepared byusing r.f. magnetron sputtering onto glass substrate. The effect of sputtering param-eters, including Ar gas pressure and input rf power, on the structure and magneticproperties was investigated. It was found that when the power is lower than 70W,the structure of the films remained single bcc-Fe phase with Cu solubility of up to50at.%. TEM observations for the bcc-Fe phase showed that the grain size was inthe nanometer range of less than 20nm. The coercivity of Fe-Cu films was largelyaffected by not only Ar gas pressure but also rf power, and reached about 2.5Oe in thepressure of 0.67-6.67Pa and in the power of less than 100W. In addition, saturationmagnetization, with Cu content less than 60at.%, was about proportional to the con-tent of bcc-Fe. When Cu content was at 60at.%, however, saturation magnetizationwas much smaller than its calculation value.
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