采用直流磁控溅射在钢基体上制备了铌薄膜,分别采用扫描电镜、原子力显微镜、X射线衍射仪、球盘式摩擦磨损实验机和电化学分析仪研究了不同溅射气压下铌膜表面形貌、相结构、耐磨性以及耐蚀性.结果表明:低压强下,晶粒细小,膜层平滑,晶粒择优取向为(110)晶面;压强升高使得晶粒粗大,粗糙度明显提高,择优取向转变为(211)晶面.较高的和较低的溅射压强对耐磨性和耐蚀性的提高较大,适中的压强对铌膜的性能提高反而较小,这可能是由于表面缺陷和组织结构的不同造成的.
参考文献
| [1] | 阳喜元,袁晓俭,胡望宇.难熔金属热学性能的研究现状[J].稀有金属材料与工程,2005(09):1349-1351. |
| [2] | 殷磊,易丹青,肖来荣,杨莉.铌表面MoSi2高温涂层的形貌和结构研究[J].稀有金属材料与工程,2005(01):91-94. |
| [3] | Hong J et al.[J].Journal of Applied Physics,1997,81:6754. |
| [4] | Salagean E E et al.[J].Surface and Coatings Technology,1996,82:57. |
| [5] | Gunzel R et al.[J].Surface and Coatings Technology,1999,116-119:1107. |
| [6] | 罗文华,倪然夫,武胜,柏朝茂.注铌法改善纯铁的抗腐蚀性研究[J].材料保护,2001(09):12-13. |
| [7] | 罗文华,倪然夫,武胜,柏朝茂.注铌法改善铀及铀铌合金抗蚀性的研究[J].材料保护,2000(08):6-8. |
| [8] | 余任泓,白新德,陈小文,金兆熊.Nb离子注入对Zr-4合金耐蚀性能的影响[J].稀有金属材料与工程,2003(12):1057-1060. |
| [9] | Thornton J A .[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1986,4:3059. |
| [10] | Harper JME.;Rodbell KP. .MICROSTRUCTURE CONTROL IN SEMICONDUCTOR METALLIZATION [Review][J].Journal of Vacuum Science & Technology, B. Microelectronics and Nanometer Structures: Processing, Measurement and Phenomena,1997(4):763-779. |
| [11] | Ward LP.;Datta PK. .CRYSTALLOGRAPHIC STRUCTURE OF MAGNETRON-SPUTTERED NB COATINGS USING REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION STUDIES[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1996(1):52-59. |
| [12] | Ward L P;Datta P K .[J].Thin Solid Films,1995,271:101. |
| [13] | 黄鹤,王学刚,朱晓东,陈华,何家文.离子束辅助磁控溅射沉积TiN薄膜的研究[J].稀有金属材料与工程,2002(03):205-208. |
| [14] | Robin A.;Rosa J.L. .Corrosion behavior of niobium, tantalum and their alloys in hot hydrochloric and phosphoric acid solutions[J].International Journal of Refractory Metals & Hard Materials,2000(1):13-21. |
| [15] | 鲜晓斌,王庆富,刘柯钊,刘清和.阴极电弧离子沉积TiN/Ti镀层腐蚀特性[J].稀有金属材料与工程,2005(11):1774-1777. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%