用循环Ar+轰击-磁控溅射离子镀(MSIP)法在U表面 上镀Al，并采用俄歇电子能谱仪(SAM)、扫描电镜(SEM)、电化学实验和湿热腐蚀加速实验， 研究了其表面、剖面形貌和耐蚀性能，以及U基和Al镀层界面.结果表明：U上循环Ar+轰 击-磁控溅射离子镀Al界面存在较宽的原子共混区，且耐蚀性能明显优于常规磁控溅射离子 镀Al.
Al coating on U substrates were prepared by repeated Ar+ bombardment-MSIP.The surface morphology,cross-sectional morphology,corros ion resistance,and interface between Al coatings have been investigated by A uger electron spectroscopy(AES),scanning electron microscopy(SEM),electrochemica l measurement,and a test in m oist atmosphere of 100% relative humidity at 95℃.The results show that the widt h of the interface layer of the coatings was more than 200 nm.The surface morpho logy of Al coatings were constituted of fine grains with smooth appearance.The c orrosion resistance of Al coatings by repeated Ar+ bombardment-MSIP was superi or to that of conventional MSIP.
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