探讨不同氮分压下磁控溅射氮化锆(ZrN)涂层对纯钛与低熔瓷粉(Vita钛瓷粉系统)结合强度的影响.60个纯钛基片随机分为1个对照组和3个实验组.实验组分别在不同氮分压下(Ta组1.0×10-2Pa,Tb组5.0×10-2Pa和Tc组10.0×10-2Pa)溅射沉积ZrN涂层.纯钛试样经表面处理后在烤瓷炉中进行烧结.用XRD检测到ZrN立方新相.万能试验机测试钛瓷试样三点抗弯强度,对照组为(26.67±0.88)Mpa,实验组分别为:Ta(49.41±0.55)Mpa,Tb(54.55±0.69)Mpa和Tc(46.24±0.53)Mpa,四组间差别均有统计学意义(P<0.05).SEM观察表明,实验组钛/瓷结合良好,钛基底残留的瓷断面数量较多,面积较大.不同氮分压下溅射沉积的ZrN涂层对钛/瓷结合的增强程度有所不同,5.0×10-2Pa下钛/瓷结合增强最为明显.
参考文献
| [1] | Albrektsson T;Hansson H A .[J].Biomaterials,1986,7(03):201. |
| [2] | Lemons J;Natiella J .[J].Dental Clinics of North America,1986,30(01):3. |
| [3] | Boening K E;Walter M H;Reppel P O .[J].Journal of Oral Rehabilitation,1992,9(03):281. |
| [4] | Okabe T;Hero H .[J].Cells and Materials,1995,5(02):211. |
| [5] | Saadet A;Semih B .[J].Journal of Prosthetic Dentistry,2000,84(05):567. |
| [6] | Adachi M;Mackert JR Jr;Parry E E et al.[J].Journal of Dental Research,1990,69(06):1230. |
| [7] | 张惠,郭天文,宋忠孝.磁控溅射ZrSiN涂层对钛瓷结合强度的影响[J].稀有金属材料与工程,2006(04):593-595. |
| [8] | 李健学,张玉梅,吴国锋,憨勇,马晓洁.钛微弧氧化表面处理对钛瓷结合强度的影响[J].稀有金属材料与工程,2008(03):495-498. |
| [9] | Chung K H;Duh J G;Shin D et al.[J].Journal of Biomedical Materials Research,2002,63(05):516. |
| [10] | Wang RR;Welsch GE;Monteiro O .Silicon nitride coating on titanium to enable titanium-ceramic bonding.[J].Journal of biomedical materials research, Part B. Applied biomaterials,1999(2):262-270. |
| [11] | Dauchot JP.;Cornelissen D.;Wautelet M.;Hecq M.;Gouttebaron R. .Synthesis of stoichiometric zirconium nitride by d.c. reactive magnetron sputtering pulsed at low frequency: characterization by ESCA, SIMS and electron microprobe[J].Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films,2000(1):607-611. |
| [12] | Niu E W;Li L;Lv G H et al.[J].Materials Science and Engineering A:Structural Materials Properties Microstructure and Processing,2007,460-461:135. |
| [13] | Del Re M.;Gouttebaron R.;Dauchot JP.;Leclere P.;Terwagne G.;Hecq M. .Study of ZrN layers deposited by reactive magnetron sputtering[J].Surface & Coatings Technology,2003(0):240-245. |
| [14] | 李宇恒,胡社军,曾鹏,吴健.ZrN系列薄膜的研究进展[J].工具技术,2007(07):7-12. |
| [15] | International Organization for Standardization .Metal-Ceramic Dental Restorative Systems[P].ISO Patent ISO9693-1999,1999. |
| [16] | Reddy G L N;Ramana J V;Kumar S et al.[J].Applied Surface Science,2007,253(17):7230. |
| [17] | Zhiguo Z;Tianwei L;Jun X et al.[J].Surface and Coatings Technology,2006,200(16-17):4918. |
| [18] | Benia HM.;Guemmaz M.;Schmerber G.;Mosser A.;Parlebas JC. .Optical properties of non-stoichiometric sputtered zirconium nitride films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2003(1/4):146-155. |
| [19] | Dauchot JP.;Wautelet M.;Hecq M.;Edart S. .SYNTHESIS OF ZIRCONIUM NITRIDE FILMS MONITORED BY IN SITU SOFT X-RAY SPECTROMETRY[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,1995(8/10):927-930. |
| [20] | Fragiel A;Staia MH;Munoz-Saldana J;Puchi-Cabrera ES;Cortes-Escobedo C;Cota L .Influence of the N-2 partial pressure on the mechanical properties and tribological behavior of zirconium nitride deposited by reactive magnetron sputtering[J].Surface & Coatings Technology,2008(15):3653-3660. |
| [21] | Yotsuya T;Yoshitake M;Kodamat T .[J].Cryogenics,1997,37(12):817. |
| [22] | Derand T;Hero H .[J].Journal of Dental Research,1992,100(03):184. |
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