采用射频等离子体化学气相沉积(RF-PECVD)方法制备了沉积时间系列的微晶硅薄膜.采用椭圆偏振光谱仪(SE)和原子力显微镜(AFM)表征薄膜表面粗糙度,分析了表面粗糙度随沉积时间的演化行为.讨论了这两种测量手段在分析薄膜表面粗糙度时的差异.结果表明,采用SE拟合得到的表面粗糙度数值要大于采用AFM直接测量得到的结果.产生差异的原因,一是由于两种测量手段的测量机制不同;二是由于薄膜的结构不均匀导致薄膜表面形貌差异.另外,还发现这两种测量手段得到的表面粗糙度数值之间存在线性关系.
参考文献
[1] | 单文光,谢正芳,吴小山,张凤鸣.硅太阳能电池铝背场P+层的模拟优化[J].人工晶体学报,2012(05):1168-1173. |
[2] | 桂全宏,佘星欣.PECVD法制备不同衬底微晶硅薄膜的研究[J].人工晶体学报,2012(03):599-604,610. |
[3] | Smirnov, V.;Lambertz, A.;Grootoonk, B.;Carius, R.;Finger, F. .Microcrystalline silicon oxide (μc-SiO _x:H) alloys: A versatile material for application in thin film silicon single and tandem junction solar cells (Conference Paper)[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2012(17):1954-1957. |
[4] | Karabacak T.;Singh JP.;Zhao YP.;Wang GC.;Lu TM. .Scaling during shadowing growth of isolated nanocolumns - art. no. 125408[J].Physical review, B. Condensed matter and materials physics,2003(12):5408-0. |
[5] | 谷锦华,丁艳丽,杨仕娥,郜小勇,陈永生,卢景霄.椭圆偏振技术研究VHF-PECVD高速沉积微晶硅薄膜的异常标度行为[J].物理学报,2009(06):4123-4127. |
[6] | 牛萍,燕红.含二氧化钛纳米复合膜的制备及对甲基橙的光催化降解[J].硅酸盐通报,2012(04):794-798. |
[7] | Gao Xiao-Yong,Feng Hong-Liang,Ma Jiao-Min,Zhang Zeng-Yuan.Spectroscopic ellipsometric study of the optical properties of Ag2O film prepared by direct-current magnetron reactive sputtering[J].中国物理B(英文版),2010(09):291-296. |
[8] | 周毅,吴国松,代伟,李洪波,汪爱英.椭偏与光度法联用精确测定吸收薄膜的光学常数与厚度[J].物理学报,2010(04):2356-2363. |
[9] | 李世彬,吴志明,李伟,于军胜,蒋亚东,廖乃镘.氢化硅薄膜的晶化机理研究[J].物理学报,2008(11):7114-7118. |
[10] | 李新利,卢景霄,王志永,谷锦华,李瑞,杨仕娥.硼掺杂微晶硅薄膜的椭圆偏振光谱分析[J].硅酸盐学报,2010(10):1905-1911. |
[11] | Saleh R.;Nickel NH. .Raman spectroscopy of B-doped microcrystalline silicon films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):266-269. |
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