TiB2 材料具有熔点高、硬度大、耐磨耐蚀、导电性好等优点,是一种有广泛应用前景的新型陶瓷材料.详述了目前国内外对TiB2膜的结构、性能及制备工艺的研究现状,同时概述了它在多方面的应用,并展望了其将来的发展趋势.
参考文献
[1] | Pierson H O;Mullendore A W .[J].THIN SOLID FILMS,1982,95:99. |
[2] | Mitterer C;Rauter M;Rodhammer P .[J].Surface and Coatings Technology,1990,41:351. |
[3] | 赵宏;金宗哲.高技术新材料要览[M].北京:中国科学技术出版社,1993:257. |
[4] | Yang Yunjie;Zheng Zhihong;Wang Xi et al.[J].Surface and Coatings Technology,1996,84:404. |
[5] | Otter F A;Amisola G B;Roman W C et al.[J].Journal of Vacuum Science and Technology A,1992,A10(04):2796. |
[6] | Shappirio J R;Finnegan J J .[J].Thin Solid Films,1983,107:81. |
[7] | 陈昌明;张立同;周万诚 等.[J].兵器材料科学与工程,1990,41:351. |
[8] | 田民波;刘德令.薄膜科学与技术手册[M].,1991:732. |
[9] | Agarwal A.;Dahotre NB. .Pulse electrode deposition of superhard boride coatings on ferrous alloy[J].Surface & Coatings Technology,1998(2/3):242-250. |
[10] | Beckloff B N;Lackey W J .[J].Journal of the American Ceramic Society,1999,82(03):503. |
[11] | Elders J;Quisht P A;Rooswijk B et al.[J].Surface and Coatings Technology,1991,45:105. |
[12] | Mukaida M;Goto T;Hirai T .[J].Journal of Materials Science,1990,25:1069. |
[13] | Karner H;Laimer J;Stori H .[J].Surface and Coatings Technology,1989,39/40(39-40):293. |
[14] | Shikama T;Sakai Y;Fukutomi M et al.[J].THIN SOLID FILMS,1988,156:287. |
[15] | Matthes B;Broszeit E;Kloos K H .[J].Surface and Coatings Technology,1990,43/44:721. |
[16] | Kelesoglu E.;Mitterer C. .Structure and properties of TiB2 based coatings prepared by unbalanced DC magnetron sputtering[J].Surface & Coatings Technology,1998(1/3):1483-1489. |
[17] | Larsson T;Blom H O;Berg S et al.[J].THIN SOLID FILMS,1989,172:133. |
[18] | Wang X;Martin P J;Kinder T J .[J].Surface and Coatings Technology,1996,78:37. |
[19] | Riviere J P;Miguer S;Cahoreau M et al.[J].Surface and Coatings Technology,1996,84:398. |
[20] | Riviere J P;Guesdon Ph;Pelafond J .[J].Nuclear Instruments and Methods in Physics Research,1991,B59-60:237. |
[21] | Tatsuya Y;Yasuaki S;Hiroshi S .[J].Nuclear Instruments and Methods in Physics Research,1993,B73:172. |
[22] | Perry A J;Tian A F;Treglio J R et al.[J].Surface and Coatings Technology,1994,68-69:528. |
[23] | Treglio J R;Trujillo S;Perry A .[J].Surface and Coatings Technology,1993,61:315. |
[24] | Ananthapadmanabhan P V;Sreekumar K P;Ravindran P V et al.[J].Journal of Materials Science,1993,28:1655. |
[25] | Mullendore A W;Mattox D M;Whitley JB et al.[J].THIN SOLID FILMS,1979,79:243. |
[26] | 向军辉;肖汉宁 .[J].陶瓷工程,1996,29:40. |
[27] | Shappirio J;Finnegan J;Lux R et al.[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1985,A3(06):2255. |
[28] | Todorovic B.;Rakocevic Z.;Markovic Z.;Gakovic B.;Nenadovic T.;Jokic T. .THE EFFECT OF RAPID THERMAL ANNEALING ON STRUCTURAL AND ELECTRICAL PROPERTIES OF TIB2 THIN FILMS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):272-277. |
[29] | Sood DK.;Katselis G.;Brown IG.;Prince KE.;Short KT. Evans PJ.;Mukherjee S. .Modification of high-temperature oxidation of titanium diboride films by implantation with tantalum and titanium ions[J].Surface & Coatings Technology,1998(0):304-311. |
[30] | Gilmore R.;Gibson PN.;Gissler W.;Baker MA. .Preparation and characterisation of low-friction TiB2-based coatings by incorporation of C or MoS2[J].Surface & Coatings Technology,1998(1/2):45-50. |
[31] | Mollart T P;Haupt J;Gilmore R et al.[J].Surface and Coatings Technology,1996,86-87:231. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%