利用弧光放电离子镀法获得了难熔超硬ＷＣ－Ｃｏ膜（其中含Ｃｏ为０，４，１５ｗｔ－％）．随着Ｃｏ含量的增加，使真空室里等离子态趋于稳定，并使成膜速度增加；其组织结构为Ｔｈｏｒｎｔｏｎ图里的Ｔ区，并逐渐由柱状晶组织变成致密的组织结构。
Super hard refractory intermetallic WC-Co (Co＝ 0, 4,15 wt-%) films were prepared by arc discharge ion-plating technique. As the Co content increasing, the plasma state in vacuum chamber tends to stable, the deposition rate increases, and the structure will be T-zone in Thornton diagram and changes gradually from columnar grains into dense film.
参考文献
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| [6] | RandhawaH,JohnsonPC,SurfCoatTechnol,1987 |
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