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功能性镀铬层具有优良的硬度和良好的耐磨性、耐蚀性,环保型电沉积功能性铬是近几年发展起来的.分析了三价铬电沉积不能增厚的原因,讨论了镀层增厚的具体措施,如提高主盐浓度、选择适宜的组合配位剂、降低镀液的pH以及采用脉冲技术等,对环保型功能性铬电沉积的发展进行了评述.

参考文献

[1] 王秋红;潘湛昌;胡光辉 等.三价铬镀液电镀铬的工艺研究[J].电镀与精饰,2010,32(11):13-16.
[2] 杨哲龙,屠振密,张景双,安茂忠.三价铬电镀的新进展[J].电镀与环保,2001(02):1-3.
[3] 屠振密,郑剑,李宁,李永彦.三价铬电镀铬现状及发展趋势[J].表面技术,2007(05):59-63,87.
[4] S. Surviliene;V. Jasulaitiene;O. Nivinskiene;A. Cesuniene .Effect of hydrazine and hydroxylaminophosphate on chrome plating from trivalent electrolytes[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(16):6738-6743.
[5] Laura Sziraki;Erno Kuzmann;Katalin Papp;Colin U. Chisholm;Mahmoud R. El-Sharif;Karoly Havancsak .Electrochemical behaviour of amorphous electrodeposited chromium coatings[J].Materials Chemistry and Physics,2012(2/3):1092-1100.
[6] 杜登学,张长鑫.二甲基甲酰胺体系三价铬镀铬的研究[J].材料保护,1995(05):19.
[7] 王华,曾振欧,赵国鹏,胡耀红.硫酸盐溶液体系中三价铬镀厚铬工艺及镀层性能研究[J].电镀与涂饰,2007(06):13-17.
[8] 侯峰岩,屠振密,屈云腾.环保型低浓度硫酸盐三价铬电沉积厚铬的研究[J].复旦学报:自然科学版,2012(02):168-172.
[9] SURVILIENE S;LISOWSKA-OLEKSIAK A;SELSKIS A et al.Corrosion behavior of Cr coatings deposited from Cr(Ⅲ) formate-urea electrolytes[J].Transactions of the Institute of Metal Finishing,2006,84(05):241-245.
[10] KUZNETSOV V V;VINOKUROV E G;KUDRYAVTSEV V N .Effect of hydrodynamic electrolysis conditions on the kinetics of cathodic processes in chromium(Ⅲ) sulfate electrolytes[J].Russian Journal of Electrochemistry,2000,36(07):756-760.
[11] 曾振欧,康振华,赵国鹏.三价铬硫酸盐溶液厚铬镀层性能研究[J].电镀与涂饰,2010(06):8-11.
[12] F.I.Danilov;V.S.Protsenko;V.O.Gordiienko;S.C.Kwon;J.Y.Lee;M.Kim .Nanocrystalline hard chromium electrodeposition from trivalent chromium bath containing carbamide and formic acid: Structure, composition, electrochemical corrosion behavior, hardness and wear characteristics of deposits[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2011(18):8048-8053.
[13] TU Z M;YANG Z L;ZHANG J S et al.Cathode polarization in trivalent chromium plating[J].Plating and Surface Finishing,1993,79(09):78-82.
[14] 屠振密.三价铬电镀机理的研究--铬层不能增厚的原因[J].材料保护,1985(03):14.
[15] 屠振密;杨哲龙;汪沧海.三价铬镀液电解时阴极附近pH值的测定[J].电镀与环保,1984(05):21-25.
[16] Surviliene S;Nivinskiene O;Cesuniene A;Selskis A .Effect of Cr(III) solution chemistry on electrodeposition of chromium[J].Journal of Applied Electrochemistry,2006(6):649-654.
[17] 艾仕云 .三价铬电镀厚铬镀层的研究[J].电镀与环保,1997,17(03):5-7.
[18] 李国华,赖奂汶,黄清安.三价铬镀液中配体的作用[J].材料保护,2005(12):44-46.
[19] Baral A;Engelken R .Modeling, optimization, and comparative analysis of trivalent chromium electrodeposition from aqueous glycine and formic acid baths[J].Journal of the Electrochemical Society,2005(7):C504-C512.
[20] SAFONOV V A;VYKHODTSEVA L N;POLUKAROV Y M et al.Valence-to-core X-ray emission spectroscopy identification of carbide compounds in nanocrystalline Cr coatings deposited from Cr(Ⅲ)electrolytes containing organic substances[J].Journal of Physical Chemistry B,2006,110(46):23192-23196.
[21] SZYNKARCZUK J;DRELA I;KUBICKI J .Electrochemical behaviour of chromium(Ⅲ) in the presence of formic acid-I[J].Electrochimica Acta,1989,34(3/4):399-403.
[22] Zeng ZX;Sun YL;Zhang JY .The electrochemical reduction mechanism of trivalent chromium in the presence of formic acid[J].Electrochemistry communications,2009(2):331-334.
[23] Giovanardi, R.;Orlando, G. .Chromium electrodeposition from Cr(III) aqueous solutions[J].Surface & Coatings Technology,2011(15):3947-3955.
[24] EL-SHARIF M;MA S;CHISHOLM C U .Environmentally acceptable process for electrodeposition of hard chromium from chromium(Ⅲ)electrolyte[J].Transactions of the Institute of Metal Finishing,1995,73(01):19-25.
[25] M.El-Sharif .Replacing hexavalent chromium in electroplating[J].Transactions of the Institute of Metal Finishing,1997(6):B143-B147.
[26] IBRAHIM S K;WATSON A;GAWNE D T .The role of formic acid and methanol on speciation rate and quality in the electrodeposition of chromium from trivalent electrolytes[J].Transactions of the Institute of Metal Finishing,1997,75(05):181-188.
[27] Zeng, Z.;Zhang, Y.;Zhao, W.;Zhang, J. .Role of complexing ligands in trivalent chromium electrodeposition[J].Surface & Coatings Technology,2011(20):4771-4775.
[28] G. Hong;K.S.Siow;G.Zhiqiang .Hard Chromium Plating From Trivalent Chromium Solution[J].Plating & Surface Finishing,2001(3):69-75.
[29] Zhixiang Zeng;Liping Wang;Aimin Liang;Junyan Zhang .Tribological and electrochemical behavior of thick Cr-C alloy coatings electrodeposited in trivalent chromium bath as an alternative to conventional Cr coatings[J].Electrochimica Acta,2006(3):1366-1373.
[30] Ching An Huang;Yu Wei Liu;Ching Hao Chuang .The hardening mechanism of a chromium-carbon deposit electroplated from a trivalent chromium-based bath[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(17):4902-4904.
[31] S. Ghaziof;M.A. Golozar;K. Raeissi .Characterization of as-deposited and annealed Cr-C alloy coatings produced from a trivalent chromium bath[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,2010(1/2):164-168.
[32] Kwon SC;Kim A;Park SU;Kim DY;Kim D;Nam KS;Choi Y .Characterization of intermediate Cr-C layer fabricated by electrodeposition in hexavalent and trivalent chromium baths[J].Surface & Coatings Technology,2004(2/3):151-156.
[33] Protsenko, V.S.;Gordiienko, V.O.;Danilov, F.I..Unusual "chemical" mechanism of carbon co-deposition in Cr-C alloy electrodeposition process from trivalent chromium bath[J].Electrochemistry communications,2012:85-87.
[34] V.S. Protsenko;F.I. Danilov;V.O. Gordiienko;S.C. Kwon;M. Kim;J.Y. Lee .Electrodeposition of hard nanocrystalline chrome from aqueous sulfate trivalent chromium bath[J].Thin Solid Films,2011(1):380-383.
[35] DUAN S;LI H;ZHANG X et al.Hard chromium plating from a trivalent plating bath[J].Plating and Surface Finishing,1995,82(06):84-86.
[36] 李惠东;段淑贞;张新 .三价铬镀液电镀硬铬研究[J].电镀与涂饰,1993,12(04):5-8.
[37] ZENG Z X;LIANG A M;ZHANG J Y .A review of recent patents on trivalent chromium plating[J].Recent Patents on Materials Science,2009,2(01):50-57.
[38] PROTSENKO;GORDIIENKO V O;DANILOV F I et al.Thick chromium electrodeposition from trivalent chromium bath containing carbamide and formic acid:An investigation into current efficiency,electrodeposition rate and surface morphology[J].Metal Finishing,2011,109(4/5):33-37.
[39] 曾志翔,梁爱民,张俊彦.三价铬电镀硬铬工艺的中试研究[J].电镀与环保,2008(02):17-20.
[40] BENABEN P .An overview of hard chromium plating using trivalent chromium solutions[OL].http://www.pfonline.com/articles/an-overview-of-hard-chromium-plating-using-trivalent-chromiumsolutions,2011-01-31.
[41] Choi Y.;Kim M.;Kwon SC. .Characterization of chrome layer formed by pulse plating[J].Surface & Coatings Technology,2003(0):81-84.
[42] G. Saravanan;S. Mohan .Corrosion Behavior Of Cr Electrodeposited From Cr(vi) And Cr(iii)-baths Using Direct (dcd) And Pulse Electrodeposition (ped) Techniques[J].Corrosion Science: The Journal on Environmental Degradation of Materials and its Control,2009(1):197-202.
[43] HE X K;QIU G Z;CHEN B Z et al.Process of pulse electrodeposition nanocrystalline chromium from trivalent chromium bath[J].Transactions of Nonferrous Metals Society of China,2007,17:s685-s691.
[44] Song Y.B.;Chin D.T. .Pulse Plating of Hard Chromium from Trivalent Baths[J].Plating & Surface Finishing,2000(9):80-87.
[45] Hui Feng;Yong Zhang;Yingliang Wei;Chen Shao;Shuo Feng;Jianmin Chen;Xingbing Wu .Study Of Single-metal Multi-nanometer Electrodeposition Chromium Layer[J].International journal of hydrogen energy,2009(2):1114-1118.
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