用恒电位电化学沉积法,尝试在氧化铝模板纳米孔内制备超长铜纳米线.透射电子显微镜(TEM)和扫描电子显微镜(SEM)分析结果表明:在较低的沉积电位下,纳米线表面较为光滑且呈现条纹结构,直径均匀,大约100 nm,线长可达40～50μm,放置一段时间后离解成颗粒状;较高沉积电位下,纳米线的边缘粗糙不平,主要由晶粒连接而成,晶粒之间有空隙存在.金属纳米线的生长实际上是金属颗粒的堆积过程,金属原子之间无较强的化学键存在.由x射线衍射(XRD)、高分辨透射电子显微镜(HRTEM)分析得知,低电位下所得纳米线为单晶结构,沿[111]方向生长,而高电位下则出现了孪晶结构.
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