用旋涂工艺和致孔法制备了一组聚甲基硅氧烷纳米多孔薄膜, 用红外吸收光谱(FT--IR)、热重分析(TGA)对其进行表征, 用同步辐射光源进行小角X射线散射测试, 在掠入射模式(GISAXS)下进行微孔结构分析。结果表明, 聚甲基硅氧烷前驱体与致孔剂具有良好的相容性; 薄膜的小角散射曲线均不遵守Porod定理、形成正偏离；所有纳米多孔薄膜具备孔分形特征; 薄膜基体与孔结构之间存在微电子密度起伏, 且薄膜孔径小于3 nm。
A group of poly(methyl)silsesquioxane nanoporous thin films were prepared by pore–generating and spin–coating processes. The nanoporous thin films were characterized using Fourier transform infrared spectroscopy (FT–IR) and thermogravimetric analyzer (TGA). And their scattering profiles and scattering intensities of the group of samples with different porosity were obtained by small angle X–ray scattering (SAXS) in grazing incidence (GISAXS) mode. The results show that there is a good compatibility between the poly(methyl)silsesquioxane precursor and porogen. The films exhibit pore fractal characteristics with disagreement with Porod’s law and give out positive deviation, and the micro–density fluctuations between film substrate and pore structure existed in the system, having a maximum 3 nm of pore radius for the group of poly(methyl)silsesquioxane nanoporous thin films.
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