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铱具有高熔点和良好的化学惰性,是宇航工业领域1800℃以上难熔金属高温抗氧化涂层的首选材料.本文阐述了难熔金属表面制各铱涂层的迫切性和必要性,对铱的特点与性质进行了详细介绍,以及从美国、日本、欧洲和中国对铱涂层的制备方法和应用背景进行了综述,重点介绍了双辉等离子技术在难熔金属表面制备铱涂层的技术优势和组织结构.

参考文献

[1] Cunzeman K.[A].California:Pasadena,2009
[2] Opeka MM;Talmy IG;Zaykoski JA .Oxidation-based materials selection for 2000 degrees C plus hypersonic aerosurfaces: Theoretical considerations and historical experience[J].Journal of Materials Science,2004(19):5887-5904.
[3] 唐勇 et al.[J].稀有金属材料与工程,2008,37(04):610.
[4] Liu C G et al.[J].Acta Astronautica,2004,55:401.
[5] 华云峰,李争显,杜继红.炭/炭复合材料抗氧化抗热震铱涂层的研究进展[J].稀有金属材料与工程,2010(11):2059-2063.
[6] Fischer B et al.[J].Platinum Metals Review,1999,43(01):18.
[7] Strife J R et al.[J].Ceramic Bulletin,1988,67(02):369.
[8] Hosoda H et al.[J].Intermetallics,2000,8:1081.
[9] 黄伯云;李成功.中国材料工程大典[M].北京:化学工业出版社,2006:414.
[10] Chen Z F et al.[J].Int JFracture,2008,153(02):185.
[11] Cawkwell, MJ;Nguyen-Manh, D;Woodward, C;Pettifor, DG;Vitek, V .Origin of brittle cleavage in iridium[J].Science,2005(5737):1059-1062.
[12] Weiland R et al.[J].Platinum Metals Review,2006,50(04):158.
[13] George E P et al.[J].Materials Science and Engineering A:Structural Materials Properties Microstructure and Processing,2001,319-321:466.
[14] Ohriner E K .[J].Platinum Metals Review,2008,52:186.
[15] El Khakani M A et al.[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1998,16:885.
[16] Mumtaz K et al.[J].Journal of Materials Science,1993,28:5521.
[17] Mumtaz K et al.[J].Materials Science and Engineering A:Structural Materials Properties Microstructure and Processing,1993,167:187.
[18] Mumtaz K et al.[J].Journal of Materials Science Letters,1993,12:1411.
[19] Li Y et al.[J].Journal of Applied Physics,2002,92:4386.
[20] Hagen J et al.[J].PLASMA PROCESSES AND POLYMERS,2009,6:678.
[21] Garcia J R V et al.[J].Materials Transactions,2003,44:1717.
[22] Harding J T et al.Air Force Rocket Propulsion Laboratory (AFRPL)[R].Edwards Air Force Base,CA,1987.
[23] Harding J T et al.Air Force Rocket Propulsion Laboratory (AFRPL)[R].California:AFRPL TR 84-036,1984.
[24] Endle J P et al.[J].Thin Solid Films,2001,388:126.
[25] Hua Y F et al.[J].Materials Science and Engineering B,2005,121:156.
[26] Maury F.;Senocq F. .Iridium coatings grown by metal-organic chemical vapor deposition in a hot-wall CVD reactor[J].Surface & Coatings Technology,2003(0):208-213.
[27] Gelfond N V et al.[J].JPhys Ⅳ France,2001,11:593.
[28] Igumenov IK;Gelfond NV;Morozova NB;Nizard H .Overview of coating growth mechanisms in MOCVD processes as observed in Pt group metals[J].Chemical vapor deposition: CVD,2007(11):633-637.
[29] Etenko A et al.[J].ECS Transactions,2007,3(14):151.
[30] Toenshoff D A.[A].Alabama:Huntsville,2000
[31] Gong Y S et al.[J].Appl SurfSci,2008,254:3921.
[32] Gong YS;Wang CB;Shen Q;Zhang LM .Low-temperature deposition of iridium thin films by pulsed laser deposition[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2008(6):594-598.
[33] Snell L et al.[J].Carbon,2001,39:991.
[34] Wang L B et al.[J].International Journal of Refractory Metals and Hard Materials,2009,27:590.
[35] Wang L B et al.[J].JCoat TechnolRes,2009,6(04):517.
[36] Wu W P et al.[J].Plasma Chemistry and Plasma Processing,2011,31:465.
[37] Wu W P et al.[J].Appl SurfSci,2011,257:7295.
[38] Chen Z F et al.[J].Surface Engineering,2011,27(04):242.
[39] Chen Z F et al.[J].Acta Astronautica,2010,66:682.
[40] Criscione J M et al.[J].AIAA Journal,1966,4:1791.
[41] Withers J C.[A].Pennsylvania:University of Pennsylvania,1957
[42] Tuffias R H et al.[P].US Patent,4917968,1990.
[43] Goto T et al.[J].Materials Science and Engineering A:Structural Materials Properties Microstructure and Processing,1996,217-218:223.
[44] Vargas R et al.[J].Applied Physics Letters,1994,65(09):1094.
[45] Goto T et al.[J].JDE Physique Ⅳ,1993,3:297.
[46] Mumtaz K.;Enoki H.;Hirai T.;Shindo Y.;Echigoya J. .THERMAL CYCLING OF IRIDIUM COATINGS ON ISOTROPIC GRAPHITE[J].Journal of Materials Science,1995(2):465-472.
[47] Mumtaz K et al.[J].Journal of Materials Science Letters,1994,13:1775.
[48] Mumtaz K et al.[J].Journal of Alloys and Compounds,1994,209:279.
[49] Mumtaz K.;Enoki H.;Hirai T.;Shindo Y.;Echigoya J. .RF MAGNETRON SPUTTERED ALUMINIUM OXIDE COATINGS ON IRIDIUM[J].Journal of Materials Science,1996(19):5247-5256.
[50] 李贺军,薛晖,付前刚,张雨雷,史小红,李克智.C/C复合材料高温抗氧化涂层的研究现状与展望[J].无机材料学报,2010(04):337-343.
[51] Kuppusami P;Murakami H et al.[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,2004,22:1208.
[52] Kamiya K;Murakami H .[J].Journal of the Japan Institute of Metals,2005,69:73.
[53] Bao Z B;Murakami H et al.[J].Corrosion Science,2011,53:1224.
[54] Isogawa S et al.[J].Surface and Coatings Technology,2002,158-159:186.
[55] Igumenov I K et al.[J].Desalination,2001,136:273.
[56] Gelfond, NV;Morozova, NB;Igumenov, IK;Filatov, ES;Gromilov, SA;Shubin, YV;Kvon, RI;Danilovich, VS .STRUCTURE OF Ir AND Ir-Al2O3 COATINGS OBTAINED BY CHEMICAL VAPOR DEPOSITION IN THE PRESENCE OF OXYGEN[J].Journal of structural chemistry,2010(1):82-91.
[57] Goswami J et al.[J].Journal of Materials Research,2001,16:2192.
[58] Wessling B et al.[J].Journal of the Electrochemical Society,2008,155:61.
[59] Wessling B et al.[J].Journal of the Electrochemical Society,2008,155:66.
[60] 蔡宏中,陈力,魏燕,胡昌义.铱薄膜的MOCVD沉积效果研究[J].稀有金属材料与工程,2010(02):209-213.
[61] 胡昌义 .CVD Ir/Re复合材料研究[D].中南大学,2002.
[62] Hua Y F et al.[J].Materials Science and Engineering B,2005,121:156.
[63] Yang W B et al.[J].Inter J Refract Met Hard Mater,2009,27:33.
[64] Yan X et al.[J].Materials Letters,2007,61:216.
[65] Wu FB.;Chen WY.;Duh JG.;Tsai YY.;Chen YI. .Ir-based multi-component coating on tungsten carbide by RF magnetron sputtering process[J].Surface & Coatings Technology,2003(0):227-232.
[66] 徐重.等离子表面冶金学[M].北京:科学出版社,2007
[67] Sun Y M et al.[J].Thin Solid Films,1999,346:100.
[68] Hogrnark S et al.[J].Wear,2000,246:20.
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