In order to deposit transparent and hard DLC films, magnetic field was introduced to enhance the plasma density of radiofrequency plasma chemical vapor deposition (RF-PCVD). In this paper, the configuration and computation of external magnetic field B are introduced. The restriction effect of magnetic field B on the charged particles and the effect of magnetic field B on the primary parameters-nonindependent power Pf and self-bias Uz were also studied. The mechanism of how magnetic field B affects self-bias Uz was analyzed.
参考文献
[1] | Felolman.US Assessment of the New Technology in Japan[M].NIST special publication,1991:897. |
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