为了探讨Gd表面溅射保护膜的附着性能,利用直流磁控溅射技术在Gd基体上分别镀Cu和Al膜.用扫描电镜(SEM)和能谱仪对薄膜进行表征,用引拉法测定了薄膜的附着强度.结果表明:A1膜表面质量好,Al/Gd界面结合好,附着强度高,在优化工艺参数条件下薄膜附着强度可达到27.60 MPa;Cu膜表面质量较差,Cu/Gd界面结合差,附着强度低,在优化工艺参数条件下薄膜附着强度最高仅为3.02 MPa.
参考文献
| [1] | Zimm C;Jastrab A;Gschneidner Jr K et al.Description and performance of a near-room temperature magnetic refrigerator[J].Advances in Cryogenic Engineering,1998,43:1957-1968. |
| [2] | 吕学超,鲜晓斌,汪小琳,郎定木,刘清和.离子轰击镀对铀上铝镀层组织及防腐蚀性能的影响[J].中国腐蚀与防护学报,2003(05):299-303. |
| [3] | 杨振炜,聂书红,刘佑铭,蔡珣,陈秋龙.电镀Zn-Ni和化学镀Ni-P交替镀层的抗腐蚀性能[J].材料保护,2003(11):12-15,23. |
| [4] | Wang F;Young D J.Effect of nanocrystallization on the corrosion resistance of K38G superalloy in CO+CO2 atmospheres[J].Oxidation of Metals,1997:48. |
| [5] | Sancheae F .Mechanically reinforced and corrosion-resistant sputtered amorphous aluminum alloy coatings[J].Surface Technology,1998,98(I/3):1162-1168. |
| [6] | Brazzle JD;Taylor WP;Ganesh B;Price JJ;Bernstein JJ .Solution hardened platinum alloy flexure materials for improved performance and reliability of MEMS devices[J].Journal of Micromechanics and Microengineering,2005(1):43-48. |
| [7] | Butilenko AK.;Khan HR.;Vovk AY. .Structural and electrical properties of cathodic sputtered thin chromium films[J].Surface & Coatings Technology,1998(2/3):197-199. |
| [8] | Hashimoto K;Kumagai N;Yoshioka H .Resistant amorphous surface alloys[J].Corresssion Science,1993,35(1-4):363-370. |
| [9] | Petkov K;Krastev V;Marinova T .XPS analysis of thin chromium films[J].Surface and Interface Analysis,1992,18(07):487-490. |
| [10] | Gautier C;Machet J .Effects of deposition parameters on the texture of chromium films deposited by vaLqlunl arc evaporation[J].Thin Solid Films,1996,289(1-2):34-38. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%