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以甲烷为前驱体,采用等离子体增强化学气相沉积( PECVD)技术沉积类富勒烯碳基( FL-C∶H)薄膜于单晶硅基底材料表面。利用高分辨透射电镜( HRTEM)和拉曼光谱仪( Ramman)对薄膜的结构形貌进行表征;通过原位纳米力学测试系统和摩擦磨损试验机分析比较薄膜在不同甲烷流量的情况下的力学特征及摩擦学特性。实验结果表明:所制备的碳基薄膜具有类富勒烯纳米结构特征,甲烷流量对类富勒烯碳基薄膜( FL-C∶H)的结构和性能具有较大的影响;薄膜的弹性模量、硬度以及薄膜中的类富勒烯结构随着甲烷流量的增加而减小,但是摩擦系数对甲烷流量的变化不敏感。

Fullerene like hydrogenated carbon ( FL-C∶ H ) thin films were deposited on the surface of monocrystalline silicon substrate by plasma enhanced chemical vapor deposition using methane as the precursors. The structure and morphology of the thin films were characterized by high resolution transmission electron microscopy and Raman spectroscopy. The machanical and tribological properties were investigated by nano-indentation and friction and wear testing machine in the case of different methane flow rate. The experimental results show that the thin films can be described as fullerene-like nanostructures. It is also found that increasing CH4 flow rate causes the decrease of fullerene-like nanostructures, elastic modulus and hardness. But the friction coefficient is not sensitive to the change of methane flow rate.

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