采用CF4射频感性和容性2种耦合等离子体分别对绝缘用硅橡胶试样表面进行疏水改性.利用原子力显微镜(AFM)和X射线光电子能谱(XPS)分析试样表面微观形貌和表面化学成分变化,采用静态接触角表征试样表面润湿性的变化.结果表明,2种处理工艺相比,容性耦合等离子体工艺处理后试样表面的Si-F与C-F物质的量比与表面粗糙度的增加量都大于感性耦合等离子体工艺处理试样;CF4射频等离子体对硅橡胶试样表面处理过程中,氟化、剥离和刻蚀的作用同时存在且互相竞争,致使在试样表面引入含氟基团的同时改变了试样的表面微观形貌;试样表面含氟基团的引入和表面粗糙度的增加之间的协同作用是改性后硅橡胶表面的疏水性能得到大幅提高的主要原因.
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