采用直流磁控共溅射法,在衬底温度为450℃的SiO2基体上制备了厚度为500nm的Ni3Al薄膜,X射线衍射（XRD）和透射电子显微镜（TEM）等测试表明,薄膜为（111）取向的L12型晶体结构金属间化合物。采用纳米压痕方法测试了薄膜的力学性能,其硬度为8.00GPa,弹性模量为200GPa。为克服亚微米级薄膜氧化增重难以测量的困难,采用四探针测试金属薄膜电阻的方法,间接给出了薄膜的腐蚀性能和高温氧化程度。结果表明Ni3Al金属间化合物薄膜的氧化速率为2.28×10-13g2/（cm4.s）,薄膜具有良好的高温抗氧化性能。
Ni3Al thin films about 500nm on SiO2 substrates were deposited by magnetron DC co-sputtering at 450℃.X-ray diffraction（XRD） and transmission electron microscopy（TEM） analyses demonstrated that the film was L12 type intermetallic compound with（111） orientation.Nanoindentation was employed to test the mechanical properties of thefilm,the results indicated that the hardness of the film was 8.00GPa and the elastic modulus was 200GPa.For avoiding the difficulty in measuring the oxidation weight increment for nano-films,this paper adopted four probe test method for the resistance of metal film,which reveal indirectly the corrosion resistance and the oxidation degree at high temperature.The calculated oxide rate was 2.28 ×10-13g2/（cm4.s）,which indicated the Ni3Al film has well high temperature oxidation resistance.
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