界面的原子结构特征对材料的性能有很重要的影响.本文介绍用选区电子衍射及高分辨电子显微术研究半导体超晶格、金属多层膜、陶瓷和复合材料相界面的精细结构及界面反应产物结构的结果.对两相之间的取向关系,界面的台阶、小面和粗糙度,界面的原子键合,界面的共格性,错配位错的性质及界面附近弹性应变松弛度,界面附近缺陷结构,电子束辐照或制备工艺条件引起的界面固态化学反应动力学和反应机制以及界面反应产物结构进行了分析和讨论。
Recent studies by the authors are reviewed of the fine structure of both the materials interfaces and the interfacial reaction products in semiconductor superlattice, metal multilayer, ceramics and composite materials by means of selected area electron diffraction patterns and high-resolution electron microscopy. Analysis and discussion in details are presented concerning the orientation relationships, the characterization of steps, facets and roughness of interfaces, atomic bonding across interface, the degree of coherency, the structure of misfit dislocation and elastic strain relaxations at interface, the presence of defects at interface, the strure of interfacial reaction products, and the reaction kinetics and mechanism.
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