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在恒电位脉冲的条件下,pH控制在0.8~1,阴极电流密度为12~20 A*dm-2,周期为25 ms,占空比为0.3,镀液温度维持在20~30 ℃,采用循环镀液的方法以避免二价铬离子的干扰,从含三价铬离子的镀液中电沉积出镍-铁-铬合金.X射线衍射结果表明沉积的镀层为晶体结构,存在较强的(111)织构.能谱和扫描电镜的结果显示电沉积出的镍-铁-铬合金镀层中含有少量的硫,其晶粒尺寸小于100 nm.通过这种方法可以获得厚镀层.电化学分析表明随着电流密度的增大,镀层的耐蚀性相应增强.

参考文献

[1] 何湘柱 .非晶态Fe-Ni-Cr合金电沉积新工艺及其理论研究[D].中南工业大学,2000.
[2] 三价铬水溶液电镀非晶态铬工艺[J].中国有色金属学报,1999(03):646.
[3] 何湘柱,龚竹青,蒋汉瀛.Cr(Ⅲ)水溶液电沉积非晶态铬的电化学[J].中国有色金属学报,2000(01):95-100.
[4] Alfantazi A M;Erb U .Synthesis of nanocrystalline Zn-Ni alloy coating[J].Journal of Metal Mater,1996,15:1361-1363.
[5] Cheung C;Palumbo G;Erb U.Synthesis of nanocrystalline permalloy by electrodeposition[J].Scripta Metallurgica et Materialia,1994(31):735-740.
[6] Chueng C;Nolan P;Erb U.Synthesis of nanocrystalline permalloy[J].Materials Letters,1994(20):135-138.
[7] Song Y.B.;Chin D.T. .Pulse Plating of Hard Chromium from Trivalent Baths[J].Plating & Surface Finishing,2000(9):80-87.
[8] TU Zhen-mi;YANG zhe-long;ZHANG Jing-shuang.Pulse plating with a trivalent chromium plating bath[J].Plating and Surface Finishing,1990(10):55-57.
[9] Watson A;Anderson A M;el-sharif M R.The role of chromium (Ⅱ) catalysed olation reactions in the sustained deposition of chromium and its alloys from environmentally acceptable chromium (Ⅲ) electrolytes[J].Transactions of The Institute of Metal Finishing,1990(68):26-32.
[10] Watson A;Chisholm C U;el-Sharif M R.The role of chromium (Ⅱ) and (Ⅵ) the electrdeposition of chromium nickel alloys from trivalent chromium-amide electrolytes[J].Transactions of The Institute of Metal Finishing,1986(64):149-153.
[11] Cheung C;Erb U;Palumbo G.Application of grain boundary engineering concepts to alleviate intergranular cracking in alloys 600 and 690[J].Materials Science and Engineering,1994(A185):39-43.
[12] 郭鹤桐;覃奇贤.电化学教程[M].天津:天津大学出版社,2000:207.
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