采用光电化学方法现场测量铜电极的开路光电压,研究铜在模拟海水3%NaCl溶液中的腐蚀行为及缓蚀剂PTD对铜的缓蚀行为.实验发现,在3%NaCl溶液中铜电极随浸泡时间的延长其开路光电压由正变负即光响应由p型光响应转变为n型光响应,这表明铜表面受到Cl-的严重侵蚀.加入缓蚀剂PTD后,当PTD的浓度小于6×10-5%时,铜电极的光响应转型时间较不加PTD时提前.当PTD的浓度大于6×10-5%时,铜电极的光响应不存在转型情况,表明PTD产生了良好的缓蚀作用.在本文条件下,PTD产生缓蚀作用的最佳浓度为1×10
The corrosion behavior of copper and the inhibition of PTD for copper were investigated with in situ photoelectrochemical method by measuring the open circuit photovoltage of copper electrode in simulated sea water. The experimental results showed that th
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