欢迎登录材料期刊网

材料期刊网

高级检索

采用未见文献报道的NaCl/AlCl3熔盐法合成多省并醌聚合物,并与常规硝基苯溶剂法进行对比,分析了聚合物的结构与热稳定性,测试了样品的介电常数与介电损耗。研究结果表明多省并醌聚合物热稳定性很好,5%质量损失温度〉380℃。20Hz下熔盐法合成的聚合物介电常数达10471;在硝基苯中所得聚合物的介电常数为9.55。多省并醌聚合物的介电常数随外加电场频率升高而降低。

A kind of molten salt NaCl/AlCl3,rarely reported in the synthesis of polymer was used to synthesize PAQR,which was compared with the one got in nitrobenzene.The structure and thermal stability of polymers have been studied as well as the dielectric constant.The results indicate that PAQR shows good thermal stability.The polymer synthesized in NaCl/AlCl3 exhibits huge dielectric constant which is over 10,000 when the frequency is 20Hz while the one of polymer synthesized in nitrobenzene is below 10.The dielectric constant of PAQR decreases rapidly as the frequency increases.Besides,two new monomers of anthraquinone 1,4-bis(octyloxy) anthracene-9,10-dione and 1,4-dibutoxyanthracene-9,10-dione are synthesized and characterized by FT-IR,1H NMR spectra and elemental analysis.Results of DSC and TG indicate melting points of two monomers are blow 130℃ and the 5% thermal decomposition temperatures are more than 200℃.

参考文献

[1] Hidekazu Sato;Akira Izumi;Hideki Matsumura .Ultrathin silicon nitride gate dielectrics prepared by catalytic chemical vapor deposition at low temperatures[J].Applied physics letters,2000(17):2752-2754.
[2] Gottlob HDB;Lemme MC;Mollenhauer T;Wahlbrink T;Efavi JK;Kurz H;Stefanov Y;Haberle K;Komaragiri R;Ruland T .Introduction of crystalline high-k gate dielectrics in a CMOS process[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2005(21/23):1885-1889.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%