欢迎登录材料期刊网

材料期刊网

高级检索

采用有机溶剂体系在紫铜基体上电沉积制备Al–碳纳米管(CNTs)复合镀层。镀液组成为:LiAlH410 g/L,四氢呋喃600 mL/L, AlCl3100 g/L,甲苯400 mL/L,柠檬酸钠20 g/L,分散剂0.4 g/L,CNTs 1 g/L。研究了电流密度、温度、搅拌速率和电镀时间对电沉积Al–CNTs复合镀层的影响,得到较好的工艺条件为:电流密度6 A/dm2,温度25°C,搅拌速率300 r/min,时间40 min。在该工艺条件下制备的Al–CNTs复合镀层呈较光亮的灰白色,厚度约为30μm,镀层的微观表面凹凸不平,但晶粒比纯Al镀层更为细致。

Al–carbon nano-tube (CNT) composite coating was prepared on pure copper substrate from an organic solvent system composed of 10 g/L LiAlH4, 600 mL/L tetrahydrofuran, 10 g/L AlCl3, 400 mL/L methylbenzene, 20 g/L sodium citrate, 0.4 g/L dispersant, and 1 g/L CNTs. The effects of current density, temperature, stirring rate, and electrodeposition time on electrodeposition of Al–CNTs composite coating were studied. The optimal process conditions were obtained as follows:current density 6 A/dm2, temperature 25 °C, stirring rate 300 r/min, and electrodeposition time 40 min. The Al–CNTs composite coating obtained under the given conditions is brightly gray-white with a thickness of ca.30μm, featuring uneven microscopic surface and finer and more compact grains as compared with pure Al coating.

参考文献

[1] 张守民,周永洽.钕铁硼磁体的AlCl3+LiAlH4有机溶液镀铝研究[J].南开大学学报(自然科学版),1999(02):14-17.
[2] 王吉会,张爱平,刘翔,田维静.Al-Mg合金镀层的制备与性能[J].中国有色金属学报,2006(04):575-579.
[3] Chen, Q.;Tan, D.-Q.;Liu, R.;Li, W.-X. .Study on electrodeposition of Al on W-Cu substrate in AlCl_3+LiAlH_4 solutions[J].Surface & Coatings Technology,2011(19):4418-4424.
[4] 裴启飞,华一新,徐存英,李艳,龚凯,吴振,刘成虎.AlCl3-BMIC 离子液体中 Na含量对铝电沉积的影响[J].中国有色金属学报,2012(11):3229-3235.
[5] 张守民,周永洽.有机溶液中铝的电镀[J].腐蚀与防护,2000(02):57-59,77.
[6] COUCH D E;BRENNER A .A hydride bath for the electrodeposition of aluminum[J].Journal of the Electrochemical Society,1952,99(06):234-244.
[7] CONNOR J H;BRENNER A .Electrodeposition of metals from organic solutions:II. Further studies on the electrodeposition of aluminum from a hydride bath[J].Journal of the Electrochemical Society,1956,103(12):657-662.
[8] ISHIBASHI N;YOSHIO M .Electrodeposition of aluminium from the NBS type bath using tetrahydrofuran-benzene mixed solvent[J].Electrochimica Acta,1972,17(08):1343-1352.
[9] YOSHIO M;ISHIBASHI N .High-rate plating of aluminum from the bath containing aluminum chloride and lithium aluminum hydride in tetrahydroufran[J].Journal of Applied Electrochemistry,1973,3(04):321-325.
[10] LEFBVRE M C;CONWAY B E .Elementary steps and mechanism of electrodeposition of Al from complex hydride ions in tetrahydroufran baths[J].Journal of Electroanalytical Chemistry,2000,480(1/2):34-45.
[11] 谢诗芳,李似聪,刘军.非水溶液电镀铝的结构研究[J].广东有色金属学报,1992(01):35.
[12] Tetsuya Tsuda;Charles L. Hussey;Gery R. Stafford .Electrodeposition of Al-Mo Alloys from the Lewis Acidic Aluminum Chloride-l-ethyl-3-methylimidazolium Chloride Molten Salt[J].Journal of the Electrochemical Society,2004(6):C379-C384.
[13] Tetsuya Tsuda;Charles L. Hussey;Gery R. Stafford .Electrochemistry of Titanium and the Electrodeposition of Al-Ti Alloys in the Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Melt[J].Journal of the Electrochemical Society,2003(4):C234-C243.
[14] ALI M R;NISHIKATA A;TSURU T .Electrodeposition of aluminum-chromium alloys from AlCl3-BPC melt and its corrosion and high temperature oxidation behaviors[J].Electrochimica Acta,1997,42(15):2347-2354.
[15] Pitner WR.;Stafford GR.;Hussey CL. .ELECTRODEPOSITION OF NICKEL-ALUMINUM ALLOYS FROM THE ALUMINUM CHLORIDE-1-METHYL-3-ETHYLIMIDAZOLIUM CHLORIDE ROOM TEMPERATURE MOLTEN SALT[J].Journal of the Electrochemical Society,1996(1):130-138.
[16] Xiangzhu He;Yongxiu Wang;Xin Sun;Liyong Huang .Preparation and Investigation of Ni-Diamond Composite Coatings by Electrodeposition[J].Nanoscience and Nanotechnology Letters,2012(1):48-52.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%