使用扫描电子显微镜、电子能谱仪、X射线衍射等研究了在N_2气氛中1150℃×10 h等温热处理的Si_3N_4/Ni,Si_3N_4/Ni_3Al平面偶界面固相反应区的形貌、成分分布、显微结构及相组成.结果表明:Si_3N_4/Ni界面固相反应形成约20 μm厚的反应区,反应区主要由Ni_3Si构成,其中分布着大量细密的孔洞;而Si_2N_4/Ni_3Al界面固相反应形成约2 μm厚的反应区,反应区具有比Ni_3Al高得多的Al含量,反应区由NiAl及Ni_3Si构成.Si_3N_4/Ni_3Al具有比Si_3N_4/Ni高得多的界面化学相容性.
The morphologies,phases,microstructure and elemental distributions of the Si_3N_4/Ni,Si_3N_4/Ni_3Al couples reaction zones annealed at 115℃ for 10 h under N_2 atmosphere were studied by means of scanning electron microscope with energy disperse spectroscopy analyzer and X-ray diffraction. The results show that interfacial solid state reaction of Si_3N_4/Ni forms a reaction zone about 20 μm thickness. The reaction zone is composed of Ni_3Si,in which a lot of small pores are distributed. Comparatively,the interfacial solid state reaction of Si_3N_4/Ni_3Al forms a reaction zone about 2μm thickness. The reaction zone is composed of NiAl and Ni_3Si,containing a very higher Al content than Ni3Al. The Si_3N_4/Ni_3Al couple has much higher chemical compatibility than the Si_3N_4/Ni couple.
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