ADP晶体{100}面族生长的实时与非实时AFM(Atomic Force Microscopy)研究表明,其相变驱动力为0.01～0.04kT/ωs时,ADP晶体(100)面的平均面粗糙度和均方面粗糙度均不到0.3 nm,小于该晶面间距0.75 nm,微观结构表现为光滑界面,与夫兰克模型、特姆金模型相符,并观测到螺位错生长;在相变驱动力为0.053～0.11kT/ωs时,ADP晶体的(100)面的平均面粗糙度和均方面粗糙度介于1.8～4.2 nm,大于该晶面间距0.75 nm,微观结构粗糙度增加,趋向于粗糙界面,可用特姆金的弥散界面模型解释,界面上观测到多二维核生长.
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