利用微弧氧化技术在钛衬底上直接制备了四方相钛酸钡铁电薄膜.利用X射线(XRD)、HP4192A阻抗分析仪和铁电测试系统(FTS)等手段对薄膜样品的相结构、介电和铁电性能进行了研究.结果表明,工艺参数为Ba(OH)2浓度为0.5mol/L,电流密度为150mA/cm2,温度为57℃,反应时间5~20min的薄膜主要要由四方相BaTiO3构成.在微弧氧化过程中,弧点的连续移动是形成四方相BaTiO3的主要原因.此工艺参数下薄膜的剩余极化值为0.271和-4.62μC/cm2(Pr),与其对应的矫顽场强度分别为20和-2.8kV/cm(Ec).该薄膜具有良好的铁电性能.
参考文献
[1] | Stojanovic B D;Foschini C R;Pavlovic V B et al.[J].Ceramics International,2002,28:293-298. |
[2] | Kreutz E W;Gottmann J;Mergesn M et al.[J].Surface and Coatings Technology,1999,116-119:1219-1227. |
[3] | 吴淼,胡明,王兴,阎实.铁电随机存储器的研究进展[J].压电与声光,2003(06):472-475. |
[4] | 蒋百灵,白力静,蒋永锋,张淑芬.铝合金微弧氧化技术[J].西安理工大学学报,2000(02):138-142. |
[5] | Albella J M;Montero I;Martiaez-Duart J M .[J].Electrochimica Acta,1987,32(02):255-258. |
[6] | Apelfeld A V;Bespalova O V;Borisov A M et al.[J].Nuclear Instruments and Methods in Physics Research,2000,B161-163:553-557. |
[7] | 张永君,李文芳,王福会.高Si压铸Al合金ADC12的微弧氧化表面改性[J].金属学报,2005(12):1289-1292. |
[8] | 滕敏,赫晓东,李垚.铝合金等离子体微弧氧化陶瓷层组织与性能研究[J].航空材料学报,2004(06):47-49. |
[9] | Xue Wenbin;Dong Zhiwei;Chen Ruyi et al.[J].Journal of Materials Science,2001,36:2615-2619. |
[10] | Krishna LR.;Somaraju KRC.;Sundararajan G. .The tribological performance of ultra-hard ceramic composite coatings obtained through microarc oxidation[J].Surface & Coatings Technology,2003(0):484-490. |
[11] | Xue Wenbin;Wang Chao;Chen Ruyi et al.[J].Materials Letters,2002,52:435-441. |
[12] | 憨勇;徐可为 .[J].无机材料学报,2001,16(05):951. |
[13] | Gnedenkov SV.;Gordienko PS.;Khrisanfova OA.;Scorobogatova TM. Sinebrukhov SL. .Formation of BaTiO3 coatings on titanium by microarc oxidation method[J].Journal of Materials Science,2002(11):2263-2265. |
[14] | Wu Chutsun;Lu Fuhsing .[J].Surface and Coatings Technolopy,2005,199:225-230. |
[15] | LI Wen-fang,HAN Bing,DU Jun,PENG Ji-hua,GAO Yin-hui.Structural characteristics of BaTiO3 films prepared by microarc oxidation[J].中国有色金属学会会刊(英文版),2006(05):1041-1044. |
[16] | 郭惠芬,张兴堂,刘兵,李蕴才,黄亚彬,杜祖亮.纳米晶钛酸钡的Sol-gel法制备及其尺寸效应[J].物理化学学报,2004(02):164-168. |
[17] | Basantakumar Sharma H;Sarma H N K;Mansingh A .[J].Journal of Materials Science,1999,34:1385-1390. |
[18] | Wang Moo-Chin;Hsiao Fu-Yuan;His Chi-Shiung et al.[J].Journal of Crystal Growth,2002,246:78-84. |
[19] | Zeng Jianming;Wang Hong;Wang Ming et al.[J].Thin Solid Films,1998,322:104-107. |
[20] | Zhu W;Akbar S A;Asiaie R et al.[J].Journal of Electroceramics,1998,2:21-31. |
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