AC Impedance Behaviour of Black Diamond Films

材料科学技术（英）, 2005, 21(6): 879-882.

^1, , ^2, , ^3,

1.Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, UK

2.Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, UK

3.Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, UK

AC Impedance Behaviour of Black Diamond Films

The first measurement of impedance on free-standing diamond films from 0.1 Hz to 10 MHz up to 300℃ were reported. A wide range of chemical vapour deposition (CVD) materials were investigated, but here we concentrate are well fitted to a RC parallel circuit model and the equivalent resistance and capacitance for the diamond films have been estimated using the Zview curve fitting. The results show only one single semicircle response at each temperature measured. It was found that the resistance decreases from 62 MΩ at room temperature to 4 kΩ at300℃, with an activation energy around 0.51 eV. The equivalent capacitance is maintained at the level of 100 pF up to 300℃ suggesting that the diamond grain boundaries are dominating the conduction. At 400℃, the impedance at low frequencies shows a linear tail, which can be explained that the AC polarization of diamond/Au interface occurs.

参考文献

[1]	O Williams;R B Jackman;C E Nebel .[J].Physica Status Solidi Section A:Applied Research,2002,193:572.
[2]	A Huanosta;A R West .[J].Journal of Applied Physics,1987,61:5386.
[3]	D C Sinclair;A R West .[J].Physical Review B,1989,39:13486.
[4]	N Hirose;A R West .[J].Journal of the American Ceramic Society,1996,79:1633.
[5]	H T Ye;C Sun;H Huang;P Hing .[J].Thin Solid Films,2001,381:52.
[6]	H T Ye;C Sun;H Huang;P Hing .[J].Applied Physics Letters,2001,78:1826.
[7]	B Baral;S S M Chan;R B Jackman .[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1996,14:2303.
[8]	H T Ye .[D].Nanyang Technological University Singapore,2001.
[9]	J R Macdonald.Impedance Spectroscopy[M].New York:John Wiley & Sons,1987:40.
[10]	R. Ramesham .Effect of annealing and hydrogen plasma treatment on the voltammetric and impedance behavior of the diamond electrode[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(1/2):222-228.
[11]	J E Bauerle .[J].Journal of Physics and Chemistry of Solids,1969,30:3657.
[12]	H T Ye;R B Jackman;P Hing .[J].Journal of Applied Physics,2003,94(12):7878.
[13]	J E Field.[M].The Properties of Diamond Academic Press London,1979
[14]	D M Malta;J A von Windheim;H A Wyn;B A Fox .[J].Journal of Applied Physics,1995,77:1536.
[15]	B Fiegl;R Kuhnert;M Ben-Chorin;F Koch .[J].Applied Physics Letters,1994,65:371.
[16]	B J Lee;B T Ahn;J K Lee;Y J Baik .[J].Diamond and Related Materials,2001,10:2174.

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AC Impedance Behaviour of Black Diamond Films

参考文献