以InCl3*4H2O、SnCl4*5H2O、乙酰丙酮为原料,采用溶胶-凝胶旋涂工艺在普通玻璃基底上制备了ITO薄膜,每次旋涂之后,将样品放在260℃的烘箱中干燥15min,然后进行第二次旋涂,最后在300℃对样品进行热处理.随着退火时间的延长,XRD衍射结果表明,薄膜的结构由退火前的InOCl的简单斜方结构转变为ITO的立方铁锰矿结构.当热处理时间为22h时,薄膜的方块电阻达到最小值1500Ω/□,电阻率为6×10-2Ω·cm,而可见光范围透过率达到最大值83%.
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