随着真空紫外光学技术的发展,在深紫外波段透过率最高、截止波段最短的氟化锂晶体重新引起人们的关注.本文结合LiF晶体本身的物理化学性质,综述了氟化锂原料制备工艺、晶体生长方法的研究进展及存在的问题.以提高氟化锂光学元件质量为出发点,总结了原料纯化、晶体生长、加工工艺对光学元件质量的影响和有效的解决措施.
参考文献
[1] | Gerasimova N G .CaF2,MgF2,SiO2,Al2O3,SiC,LiF,BaF2,and ZrO2 optical single crystals used in studies in the VUV spectral Region[J].Instruments and Experimental Techniques,2006,49(03):408. |
[2] | Alfons P;Oliver L;Taiju T .Emission spectroscopic characterization of F-2 colour centres in a LiF crystal[J].Optics Communications,2002,214:305. |
[3] | Rosa M M;Antonella M;Giancarlo C R et al.Active stripe waveguides produced by electron beam lithography in LiF single crystals[J].Optics Communications,1998,153:223. |
[4] | Basieva T T;Konyushkina V A;Kuznetsov S V .Thermal conductivity of γ-irradiated LiF single crystals[J].Technical Physics Letters,2008,34(08):702. |
[5] | Sarantopoulou E;Kollia Z;Cefalas A C et al.Light induced adsorption of Si nano-composites in LiF crystals at 157 nm[J].Applied Surface Science,2007,253:4438. |
[6] | ISO 21348.ISO 21348.Process for Determining Solar Irradiances[S]. |
[7] | 薛春荣,易葵,魏朝阳,邵建达,范正修.真空紫外到深紫外波段基底材料的光学特性[J].强激光与粒子束,2009(02):287-290. |
[8] | 纪慎功;李艳红 .真空紫外波段光学晶体材料的研制[J].人工晶体学报,2000,29(05):100. |
[9] | Marvin J W.Handbook of optical materials[M].New York:crc Press,2003 |
[10] | 李艳红;纪慎功 .氟化物晶体加工工艺的研究[J].人工晶体学报,2000,29(05):223. |
[11] | 张晓伟,李梅,柳召刚,胡艳宏,吴锦绣.稀土在玻璃中的着色和紫外吸收作用的研究进展[J].硅酸盐通报,2009(06):1208-1212. |
[12] | Li H H .Refractive index of alkali halides and its wavelength and temperature derivatives[J].Journal of Physical and Chemical Reference Data,1976,5(02):329. |
[13] | Laporte P;Subtil J L;Courbon M et al.Vacuum-ultraviolet refractive index of LiF and MgF2 in the temperature range 80-300 K[J].Washington,DC:Optical Society of America,1983,73(08):1062. |
[14] | Tomoru O;Toshio I .Methods of making fluoride crystal and fluorie crystal lens[P].US Patent:20020020338,2002-2-21. |
[15] | 蒋崇义 .氟化锂晶体生长[J].人工晶体学报,1979,4:1-4. |
[16] | 刘有明;张俊英 .浮称自动控制生长氟化锂晶体[J].人工晶体学报,1981,4:9-11. |
[17] | Rober W S .Fluoride lens crystal for optical microlithography systems[P].US Patent:20020102497,2002-01-01. |
[18] | 曹忠良;王珍云.无机化学反应方程式手册[M].长沙:湖南科学技术出版社,1985 |
[19] | 陈寿椿.重要无机化学反应[M].上海:上海科学技术出版社,1994 |
[20] | Rober D G .Lithium fluoride production[P].US Patent:3179495,1965-04-20. |
[21] | Rober D .Lithium fluoride production[P].US Patent:3241914,1966-03-22. |
[22] | 王永斌;杨进忠;雷思维 等.制备高纯氟化锂的方法[P].CN200810181520,2009-06-24. |
[23] | Alain K;Alexandre M M .Method of making high purity optical fluoride crystals[P].US Patent:20030089304,2003-05-15. |
[24] | 孔宝国;陈瑞芳 .提拉法生长大尺寸氟化锂单晶体的研究[J].光学仪器,1995,17(03):12-15. |
[25] | 刘景和.提拉法生长晶体开裂的理论分析[J].人工晶体,1984(04):281. |
[26] | 苏良碧,杨卫桥,董永军,周圣明,周国清,徐军.氟化钙晶体生长的研究进展[J].人工晶体学报,2003(05):476-482. |
[27] | Tsutomu M;Shuuichi T .Method for annealing single crystal fluoride and method for manufacturing the same[P].US Patent:6146256,2000-11-14. |
[28] | John H B;Michael E P;Juergen T et al.Optical lithography fluoride crystal annealing furnace[P].US Patent:7198673,2007-04-03. |
[29] | Sitdikov O.;Kaibyshev R. .Dislocation glide and dynamic recrystallization in LiF single crystals[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2002(1/2):147-155. |
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