沉积温度对磁控溅射生长SrRuO_3薄膜结构和性能的影响

人工晶体学报, 2010, 39(1): 135-148.

沉积温度对磁控溅射生长SrRuO_3薄膜结构和性能的影响

王宽冒 ^1, , 张沧生 ^2, , 李曼 ^3, , 周阳 ^4, , 王玉强 ^5, , 王侠 ^6, , 彭英才 ^7, , 刘保亭 ^8,

1.河北大学物理科学与技术学院,保定,071002

2.河北大学计算中心,保定,071002

3.河北大学物理科学与技术学院,保定,071002

4.河北大学物理科学与技术学院,保定,071002

5.河北大学物理科学与技术学院,保定,071002

6.河北大学电子信息工程学院,保定,071002

7.河北大学电子信息工程学院,保定,071002

8.河北大学物理科学与技术学院,保定,071002

基金项目: 河北省应用基础研究计划重点基础研究项目(08965124D) 教育部科学技术研究重点项目(207013) 河北省自然科学基金项目(E2008000620) 国家自然科学基金(60876055)

关键词： SrRuO_3 , 磁控溅射 , 外延薄膜

Effect of Deposition Temperature on the Structural and Physical Properties of SrRuO_3 Films Fabricated by Magnetron Sputtering

WANG Kuan-mao ^1, , ZHANG Cang-sheng ^2, , LI Man ^3, , ZHOU Yang ^4, , WANG Yu-qiang ^5, , WANG Xia ^6, , PENG Ying-cai ^7, , LIU Bao-ting ^8,

1.河北大学物理科学与技术学院,保定,071002

2.河北大学计算中心,保定,071002

3.河北大学物理科学与技术学院,保定,071002

4.河北大学物理科学与技术学院,保定,071002

5.河北大学物理科学与技术学院,保定,071002

6.河北大学电子信息工程学院,保定,071002

7.河北大学电子信息工程学院,保定,071002

8.河北大学物理科学与技术学院,保定,071002

Keywords： SrRuO_3 , magnetron sputtering , epitaxial flim

采用射频磁控溅射法在(001)SrTiO_3基片上制备了SrRuO_3薄膜,采用X射线衍射(XRD)、原子力显微镜(AFM)、四探针测试仪等分析方法系统研究了沉积温度对SrRuO_3薄膜结构、表面形貌及输运性质的影响.实验结果表明:当生长温度低于550 ℃时,SrRuO_3薄膜为多晶结构;当温度在550～650 ℃范围内变化时,SrRuO_3薄膜可以在SrTiO_3基片上外延生长,薄膜的最低电阻率约为0.5 mΩ·cm.

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