先基于实际工艺条件和频域有限差分法,优化了纳米压印三角带型a-Si太阳电池织构结构,然后重点探讨了有源层和铝背反镜厚度偏差、SiNx增透膜折射率和厚度偏差及织构结构几何尺寸偏差对a-Si太阳电池光电流密度的影响.研究表明:TM模受有源层和铝背反镜厚度偏差、SiNx增透膜折射率和厚度偏差及织构结构几何尺寸偏差的影响较小,平均光电流密度的变化主要受TE模光电流随工艺偏差的影响;增透膜和压印模板制备过程中,有效控制工艺参数的偏离是获得最优a-Si太阳电池设计性能的关键.
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