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通过选取室温、100℃、200 ℃三个不同基片温度制度来探讨基片温度对氧化钨薄膜电致变色循环寿命的影响.实验结果表明:当基片温度由室温提高至100℃后,氧化钨薄膜的循环寿命有较大的改善,循环次数由806次提高至3000次.当基片温度由100℃提高至200℃时,循环寿命反而有所衰退,循环次数由3000次减少至1000次.

参考文献

[1] Dane T. Gillaspie;Robert C. Tenent;Anne C. Dillon.Metal-oxide films for electrochromic applications: present technology and future directions[J].Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology,201043(43):9585-9592.
[2] Lee, SH;Deshpande, R;Parilla, PA;Jones, KM;To, B;Mahan, AH;Dillon, AC.Crystalline WO3 nanoparticles for highly improved electrochromic applications[J].Advanced Materials,20066(6):763-767.
[3] Kamal H;Akl AA;Abdel-Hady K.Influence of proton insertion on the conductivity, structural and optical properties of amorphous and crystalline electrochromic WO3 films[J].Physica, B. Condensed Matter,20041/4(1/4):192-205.
[4] 黄银松;章俞之;宋力昕;胡行方.多晶氧化钨薄膜的制备及其红外反射调制性能研究[J].无机材料学报,2002(6):1263-1268.
[5] C.G. Granqvist.Electrochromic devices[J].Journal of the European Ceramic Society,200512(12):2907-2912.
[6] 王丽阁 .磁控溅射非晶WO<,3>薄膜及其电致变色性能研究[D].大连理工大学,2006.
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