利用透射电子显微镜及X射线衍射,研究脉冲激光沉积技术(PLD)在Si(001)衬底上生长LiNbO3薄膜的微结构.结果表明,在600℃的衬底温度、30Pa的氧分压条件下,在硅片表面5nm厚的非晶氧化层上生长的薄膜,为c轴择优取向的单相LiNbO3晶体.本文还讨论了获得c轴择优取向LiNbO3薄膜的生长机理.
A lithium niobate (LiNbO3) thin film was fabricated by a pulsed laser deposition method on Si(001) substrate with about 5nm-thick amorphous silicon oxide surface layer, under the conditions of 600℃ substrate temperature and 30 Pa oxygen pressure. The film was investigated by transmission electron microscope and X-ray diffraction. The factors influencing on the evolution and preferred orientation of the LiNbO3 were discussed. The results obtained show that the LiNbO3 thin film is highly c-axis oriented perpendicularly to the substrate under the optimized deposition conditions above mentioned.
参考文献
| [1] | Weis R S, Gaylord T K. Appl. Phys., A, 1985, 37: 191--203. [2] 张洪喜, 强亮生, 徐崇泉(ZHANG Hong-Xi, et al). 硅酸盐学?报(Journal of the Chinese Ceramic Society), 1996, 24 (8): 442--445. [3] 冯少新, 李宝全, 杨智, 等(FENG Shao-Xin, { et al}). 无机材料学报(Journal of Inorganic Materials), 2003, 18 (2): 283--288. [4] Kawaguchi T, Yoon D H, Minakata M, et al. J. Crystal Growth, 1995, 152: 87--93. [5] Lee S Y, Feigelson R S. J. Crystal Growth, 1998, 186: 594--605. [6] Lee S Y, Feigelson R S. J. Mater. Res., 1999, 14: 2662--2667. [7] Nashimoto K, Chma M J, Mcintyre P C, et al. J Mater. Res., 1995, 10: 2564--2572. [8] Kakehi Y, Okamoto A, Sakurai Y, et al. Appl. Surface Sci., 2001, 169-170: 560--563. [9] Franck V, Madeleine G, Pascal A, et al. Thin Solid Films, 1998, 336: 163--167. [10] 王新昌, 叶志镇, 何军辉, 等. 真空科学与技术, 2003, 23: 129. [11] Ye Z Z, He J H, Liu Z G, et al. Mater. Lett., 2002, 55: 265. [12] Guo X L, Hu W S, Liu Z G, et al. Mater. Sci. Eng. B, 1998, 53: 278--283. [13] 吴状春, 胡卫生, 刘俊明, 等. 物理学报, 1998, 47 (2): 239--244. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%