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采用闭合场非平衡磁控溅射离子镀技术于不同本底真空度下制备了Cr/C镀层.利用TEM、划痕仪分析了不同真空度下镀层微观截面形貌与结合强度的变化.结果表明,随本底真空度的降低,Cr/C镀层中物理混合界面层和Cr金属打底层的厚度显著减小;镀层结合强度随本底真空度的降低显著下降,物理混合界面层、Cr金属打底层厚度的减小以及镀层表面孔洞等缺陷增多、致密度变差等共同导致了其结合强度的下降.

Cr/C coatings were deposited under different basic pressure using closed field unbalanced magnetron sputter ion plating technique.Cross section micrographs and adhesion strength of the coatings were analyzed by TEM and scratch tester.The results show that:both the thickness of physical mixed interface layer and Cr bond layer was reduced significantly with the basic pressure decreased.Adhesion strength of coatings was diminishing with the basic pressure decreased.The increase in thickness of physical mixed interface layer and Cr bond layer and defects in surface such as holes and denseness reduced were the main reasons.

参考文献

[1] 戴达煌;周克崧;袁镇海.现代材料表面技术科学[M].北京:冶金工业出版社,2004:397-399.
[2] Kelly P J;Arnell R D .[J].Vacuum,2000,56:159-172.
[3] Window B .[J].Surface and Coatings Technology,1995,71:93-97.
[4] Musil J. .Recent advances in magnetron sputtering technology[J].Surface & Coatings Technology,1998(1/3):280-286.
[5] Arnell R D;Kelly P J;Musil J .[J].Surface and Coatings Technology,1999,112:170-176.
[6] Cooke KE.;Hamsphire J.;Southall W.;Teer DG. .The industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion plating[J].Surface & Coatings Technology,2004(0):789-794.
[7] Yang S.;Renevier NM.;Teer DG.;Li X. .Tribological properties and wear mechanism of sputtered C/Cr coating[J].Surface & Coatings Technology,2001(0):85-93.
[8] Bai Lijing;Zhu Xiaodong;Xiao Jiming et al.[J].Surface and Coatings Technology,2007,201:5257-5260.
[9] Zhang Guojun;Yang Shicai;Jiang Bailing.[J].Thin Solid Films,2004(25):827-831.
[10] 吴文文 .镁合金表面碳基减摩镀层制备技术及微观组织的研究[D].西安理工大学,2008.
[11] Anders A .Fundamentals of pulsed plasmas for materials processing[J].Surface & Coatings Technology,2004(2/3):301-311.
[12] 郝雷,刁训刚,胡小草,张鲁豫,郝维昌,王天民.柔性衬底ITO薄膜的制备及其光电性能研究[J].真空科学与技术学报,2008(03):256-260.
[13] 霍纯青,桑利军,陈强,岳蕾,付亚波.等离子体处理提高金属镀层与有机基底附着力的研究[J].真空科学与技术学报,2008(04):379-382.
[14] Chiu SM;Hwang SJ;Chu CW;Gan DS .The influence of Cr-based coating on the adhesion force between epoxy molding compounds and IC encapsulation mold[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1):285-292.
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