利用非平衡磁控溅射离子镀技术研究了不同氮气流量对TiN薄膜结构、摩擦性能、附着力及显微硬度的影响.研究结果表明:N2流量对TiN薄膜的择优取向有很大影响,N2流量较小时,TiN薄膜显示出{111}择优取向生长趋势,在N2流量为15sccm条件下沉积的TiN薄膜的(111)衍射峰强度最强,与之对应的薄膜硬度和膜基结合强度最高,耐磨性能也最好;N2流量的大小对TiN薄膜的沉积速率和摩擦系数影响显著,并随N2流量增加都有较明显的下降趋势.
参考文献
| [1] | Windows B;Safides N .Charged panicle fluxes from planar magnetron sputtering sources[J].Journal of Vacuum Science and Technology,1986,A4:196. |
| [2] | Musil J;Kadlec S;Vyskocil J et al.Reactive deposition of hard coatings[J].Surface and Coatings Technology,1989,39-40:301. |
| [3] | Wolf-Dieter Munz .The unbalanced magnetron current status of development[J].Surface and Coatings Technology,1991,48:81. |
| [4] | S. Guruvenket;G. Mohan Rao .Effect of ion bombardment and substrate orientation on structure and properties of titanium nitride films deposited by unbalanced magnetron sputtering[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2002(3):678-682. |
| [5] | 吴自勤;王兵.薄膜生长[M].北京:科学出版社,2001:170. |
| [6] | Greene J E et al.Dense fully 111-textured TiN diffusion barriers:Enhanced liretime through microstructure control during layer growth[J].Journal of Applied Physics,1999,86(07):3635. |
| [7] | LiD;Lin X W et al.Structure and hardness studies of CNx/@TiN nano-composite coatings[J].Applied Physics Letters,1996,68(09):1211. |
| [8] | Thornton J A .Structure and topography of sputtered coatings[J].Annual Review of Materials Science,1977,7:239. |
| [9] | 严一心;林鸿海.薄膜技术[M].北京:兵器工业出版社,1994:89. |
| [10] | Arnell RD.;Minnebaev KF.;Yurasova VE.;Colligon JS. .THE EFFECT OF NITROGEN CONTENT ON THE STRUCTURE AND MECHANICAL PROPERTIES OF TIN FILMS PRODUCED BY MAGNETRON SPUTTERING[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,1996(5):425-431. |
| [11] | Groudeva-Zotova S;Kaltofen R;Sebald T .DC reactive magnetron sputter deposition of(111)textured TiN films-influence of nitrogen flow and discharge power on the texture formation[J].Surface and Coatings Technology,2000,127:144. |
| [12] | Svadkovski IV.;Golosov DA.;Zavatskly SM. .Characterisation parameters for unbalanced magnetron sputtering systems[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(4):283-290. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%