使用磁控共聚焦溅射技术并改变溅射过程中Al的功率来制备了一系列A1含量不同的氮化钛铝(TiAlN)薄膜.在溅射过程,薄膜沉积速率和Al含量随Al的溅射功率增加而增大,而薄膜的粗糙度减小.Al含量较低时(约21%),TiAlN薄膜的硬度和弹性模量都高于TiN薄膜.而Al含量较高时(＞26%),薄膜的硬度和弹性模量也随含量增加减小.
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