为获得高致密度、高热导率及低氧含量的钨喷涂层,采用低压等离子喷涂(LPPS)技术,以4种不同工艺参数在铬锆铜基体上制备了0.9～1.2 mm钨喷涂层.用扫描电镜、氧氮分析仪及闪光导热仪研究了4种钨喷涂层的显微结构、氧含量及热导率,揭示了优化工艺制备的钨喷涂层的孔径分布,分析了喷涂功率和真空室压力对涂层的影响.结果表明,4种钨喷涂层均呈层状结构,优化工艺制备的钨喷涂层的致密度为98.4％,氧含量为0.2％(质量分数),热导率为110.76 W/(m·K),孔隙的主要孔径分布范围为0.2～4.0μm,以1.0.m左右的孔隙为主.
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