利用脉冲激光沉积(PLD)方法在MgO(100)基片上生长了SrBi2Nb2O9薄膜.XRD分析表明在MgO基片上生长的薄膜呈(115)单一取向,具有良好的结晶性;XPS数据分析得到薄膜中Sr、Bi和Nb的原子比约为1:2:2.05.利用Z扫描技术对薄膜的三阶非线性光学性质进行了测量,通过开孔(Open-aperture)和小孔(Close-aperture)的测量,计算出三阶非线性光学极化率的实部Rex(3)和虚部Imx(3)分别为4.139×10-7eSu,1.104×10-7eSu.
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