介绍了金刚石膜在下一代X射线光刻掩模中应用的必要性;通过调节衬底温度,改变生长时间、控制甲烷浓度等工艺措施,实验研究了不同参数对成核密度及成核质量的影响,获得了高密度形核的样品;对形核后的预生长期进行了工艺优化,有效地控制了核岛的优势生长,总结出了一套优化的形核方案,即甲烷浓度4％,衬底温度700℃,形核时间14min;这套工艺不仅改善了自支撑金刚石薄膜窗口的光学性能,还有效地降低了膜的内应力。
Diamond films are essential to next generation X-ray lithography mask. The affection of different
process parameter to nucleation density and nucleation quality were investigated by controlling substrate-temperature, changing growth-time
and CH4 concentration etc., and some high-density nucleation samples were obtainted. Mean time, pregrowth process after nucleation of
diamond films was improved and dominant growth of major island was restrained effectively. The results show that the nucleation process
can be optimized as 14% of CH4 concentration, 700℃ of substrate-temperature, 14min of nucleation. The optical properties and stress distribution
of free-standing diamond membranes can be improved greatly.
参考文献
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