欢迎登录材料期刊网

材料期刊网

高级检索

本文以升华法实现了以(10(1)5)面为籽晶的6H-SiC单晶扩径生长,获得最大直径达33 mm的6H-SiC单晶.采用光学显微镜观察晶体纵切片,发现源于包裹体的沿生长方向延伸的微管发生转弯现象,转向后在(0001)面内延伸,同时籽晶内沿c轴延伸的微管也终止于生长界面.通过光学显微镜观察单晶生长表面形貌,发现(101n)面生长,随着n的增大层错密度逐渐减小,这与横切片的腐蚀结果相对应;随着微管的终止和层错的减少得到了无微管的高质量单晶区.

参考文献

[1] Tairov Y M;Tsvetkov V F .Investigation of Growth Processes of Ingots of Silicon Carbide Single Crystals[J].Journal of Crystal Growth,1978,43:209-212.
[2] Neudeck P.G.;Powell J.A. .Performance limiting micropipe defects in silicon carbide wafers[J].IEEE Electron Device Letters,1994(2):63-65.
[3] Takahashi J.;Katsuno M.;Shinoyama S.;Ohtani N. .SUBLIMATION GROWTH OF 6H- AND 4H-SIC SINGLE CRYSTALS IN THE [1(1)OVER-BAR-00] AND [11(2)OVER-BAR-0] DIRECTIONS[J].Journal of Crystal Growth,1997(3):229-240.
[4] Shiomia H;Kinoshitaa H;Furushoa T et al.Crystal Growth of Micropipe Free 4H-SiC on 4H-SiC{0338} Seed and High-purity Semi-insulating 6H-SiC[J].Journal of Crystal Growth,2006,292:188-191.
[5] Knippenberg W F .Growth Phenomena in Silicon Carbide[J].Philips Research Reports,1963,18:257.
[6] Li J;Filip O;Epelbaum BM;Xu X;Bickermann M;Winnacker A .Growth of 4H-SiC on rhombohedral (01(1)over-bar-4) plane seeds[J].Journal of Crystal Growth,2007(1):41-49.
[7] 徐现刚,胡小波,王继扬,蒋民华.大直径6H-SiC单晶的生长[J].人工晶体学报,2003(05):540.
[8] 杨莺,陈治明.湿法腐蚀工艺研究碳化硅晶体缺陷表面形貌[J].人工晶体学报,2008(03):634-638.
[9] Frank F C .Capillary Equilibria of Dislocated Crystal[J].Acta Crystallographica,1951,4:497-501.
[10] Momeen;Khan M Y .Stacking Fault Energy of Silicon Carbide (SiC) Polytypes[J].Crystal Research and Technology,1995,30:1127.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%