综述了反射镜用SiC陶瓷表面改性涂层的研究现状，重点介绍了化学气相沉积（CVD）和物理气相沉积（PVD）制备SiC涂层和硅涂层的优缺点及制备机理，并讨论了SiC陶瓷光学部件表面改性今后的发展方向。
The recent development of SiC ceramic surface modification with coating was summaried. The merits and demerits of chemical vapor deposition (CVD) through which the SiC coating and the Si coating were prepared were introduced as well as physical vapor deposition (PVD). The future development of SiC surface modification was also discussed.
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