采用磁控溅射技术在钼圆片基体表面制备了镍薄膜,并用扫描电镜、平整度仪和X射线衍射分析仪对其进行了表征.研究了不同负偏压对薄膜附着力、微观结构、平整性、晶粒取向以及大小的影响.结果表明,随负偏压增大,薄膜与基体结合力明显增强;适当的负偏压能改善薄膜表面致密性和平整性,在450 V时达到最优.但当负偏压进一步升高到600 V时,镍膜的表面起伏反而变大,平整性有所下降.负偏压对镍膜晶面生长的择优取向影响并不明显,而晶粒尺寸随负偏压增加呈增大的趋势.
参考文献
| [1] | 张一雯,傅蔡安,王慧.预处理对钼基片镀钌层结合力的影响[J].电镀与涂饰,2011(07):13-15. |
| [2] | 臧纯勇,汤慧萍,王建永,葛渊,石英.钼金属高温抗氧化能力的研究概况[J].热加工工艺,2008(24):125-128. |
| [3] | 丁孟贤.聚酰亚胺-化学、结构与性能的关系及材料[M].北京:科学出版社,2006 |
| [4] | AL-KANDARY SH;ALI A A M;AHMAD Z .Morphology and thermo-mechanical properties of compatibilized polyimide-silica nanocomposities[J].Journal of Applied Polymer Science,2005,98(6):2521-2531. |
| [5] | MATTOX D M .Surface effects on the growth,adhesion and properties of reactively deposited hard coatings[J].Surface and Coatings Technology,1996,81(1):8-16. |
| [6] | Tan JN.;Hsieh JH. .Deposition and characterization of (Nb,Cr)N thin films by unbalanced magnetron sputtering[J].Surface & Coatings Technology,2003(2/3):154-160. |
| [7] | 纠智先,李强.沉积温度对制备ZnS薄膜的影响[J].武汉工业学院学报,2008(02):90-92. |
| [8] | 马瑞新,李士娜,锁国权,任磊.偏压对ITO薄膜生长模式和光电性能的影响[J].材料科学与工艺,2012(04):65-69. |
| [9] | Kang T.W.;Kim T.W. .Structural properties of TiN films grown on stainless steel substrates by a reactive radio-frequency sputtering technique at low temperature[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,1999(1):190-194. |
| [10] | 李瑞文,邹觉生,鲜晓斌.负偏压对Be上磁控溅射离子镀Al膜结构影响的研究[J].真空,2002(03):30-32. |
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