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以多孔Al<,2>O<,3>陶瓷管为载体,采用化学镀法制备了钯膜.考察了化学镀温度及载体孔径对制备钯膜的影响,并利用扫描电镜对钯膜形貌结构进行了表征.研究表明,化学镀15 min,钯沉积速率较快;反应时间延长至120 min,钯沉积量增加,但是沉积速率降低.随着化学镀温度的升高,钯沉积量增加;但是温度过高,会导致钯利用率降低;温度为318 K,化学镀钯膜较适宜.在孔径为0.2μm的Al<,2>O<,3>陶瓷管表面制备的钯膜平整、致密,其二次镀钯膜N<,2>渗透速率为1.7×10<'-9> mol/(m<'2>·S·Pa).

参考文献

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