The Influence of Nitrogen and Boron Implant into Silicon Substrate on the Phase and Internal Stress of c-BN Films

材料保护, 2004, 37(z2): 221-224.

^1, , ^2, , ^3,

1.National Key Laboratory for Remanufacturing, Beijing 100072 ,P. R. China

2.National Key Laboratory for Remanufacturing, Beijing 100072 ,P. R. China

3.National Key Laboratory for Remanufacturing, Beijing 100072 ,P. R. China

基金项目: This research is funded by NNSF(5997106s) national key laboratory for remanufacturing

The Influence of Nitrogen and Boron Implant into Silicon Substrate on the Phase and Internal Stress of c-BN Films

Cubic boron nitride(c-BN) film was deposited on a Si (100) substrate by the RF-magnetron sputtering.The mainly problems for fabrication of c-BN films are the low purity and high intrinsic compressive stress. In order to solve the two problems, the c-BN film with the buffer interlayer was deposited on the substrate which had been implanted with nitrogen and/or boron ions. The results show: the implantation of nitrogen ions can obviously increase c-BN content and reduce the internal stress slightly; while the implantation of boron shows no obvious improvement to the content of c-BN, which can reduce the internal stress in the film obviously. In addition, it is suggested that the implantation of nitrogen and boron shows the best result, which not only can increase the content of c-BN, but also reduce the internal stress in the c-BN film obviously.

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材料期刊网

The Influence of Nitrogen and Boron Implant into Silicon Substrate on the Phase and Internal Stress of c-BN Films

参考文献