The mean sputter depth depends on the surface composition gradient during ion implantation. For the high fluence ion implantation into a Pt-Cu alloy, the surface composition gradient of Cu is so large that the difference in mean sputter depth between Pt and Cu, is significant. However, for the high fluence ion implantation into B-10-B-11 isotope mixture, the surface composition gradient of B-10 is so small that the difference in mean sputter depth between B-10 and B-11 is insignificant.
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