研究了脉冲参数（脉冲高度、宽度、以及反向脉冲等参数）对Ni—P合金镀层P含量、微观形貌等特性影响的规律。结果表明，平均电流密度与反向脉冲电流密度对镀层的P含量有较大地影响；占空比、频率对镀层的微观形貌影响较大。与直流电沉积法制备的Ni—P镀层相比，在不改变镀液组成的条件下，脉冲电沉积法可以显著提高Ni—P合金镀层的P含量。
This paper discussed the influence of pulse parameters (pulse height, pulse width and reverse pulse variables) on the phosphorous content and morphology of Ni-P coatings. The result showed that both average current density and reverse anodic current density had a strong effect on the phosphorous content, whereas duty circle and frequency had great impact on the morphology of coatings. Compared with the Ni-P coatings prepared via direct current electrodeposition, pulse plating method increases the content of phosphorous without changing the composition of the solution.
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