ZnO薄膜具有压电、光电、压敏、气敏、发光等多种特性,应用十分广泛.介绍了ZnO薄膜气相法制备原理中的各类主要方法,包括脉冲激光沉积、磁控溅射、分子束外延、金属有机化合物化学气相沉积、单源化学气相沉积和等离子体增强化学气相沉积等技术；分析了这些方法的优缺点；展望了ZnO薄膜今后的研究方向.
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