磁控溅射制备五氧化二钒薄膜的研究

功能材料, 2005, 36(2): 285-287.

1.厦门大学,物理系,福建,厦门,361005;厦门大学,萨本栋微机电研究中心,福建,厦门,361005

2.厦门大学,萨本栋微机电研究中心,福建,厦门,361005

3.厦门大学,萨本栋微机电研究中心,福建,厦门,361005

4.厦门大学,物理系,福建,厦门,361005;厦门大学,萨本栋微机电研究中心,福建,厦门,361005

基金项目: 国家重点基础研究发展计划(973计划)(001CB610505) 福建省自然科学基金(E0110004) 国家自然科学基金(90206039)

Studies of vanadium pentoxide thin films prepared by R.F. magnetron sputtering methods

采用射频磁控溅射的方法,在不同条件下制备了氧化钒薄膜样品,分别在不同温度条件下做了退火处理,并对退火前后样品做了X射线衍射(XRD)、X射线光电子能谱(XPS)和激光扫描共聚焦显微镜测试与分析,旨在得出制备良好的V2O5薄膜的条件.

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