描述了利用射频等离子体溅射法,采用不同阴极在衬底Si片上形成类金刚石薄膜的杂质含量及杂质对厚度和硬度的影响分析与结果;比较了DLC膜的力学性能在有无金属杂质情况下的异同,分析和计算了其厚度与硬度与制备参数间的关系,得出利用石墨作电极能制备出质量较好的DLC膜,初步探讨了在Si衬底上沉积高硬度和强附着度类金刚石薄膜的有关工艺条件,并在理论上对这一结果进行了解释.
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